Lithography Equipment

Lithography Equipment

Intelligent Micro Patterning Showcases Two New Products at Transducers '09

The SF-100 XCEL and SF-100 XTEND Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced today two new products to add to its product line, the SF-100 XCEL and SF-100 XTEND. Both systems are unique, maskless photolithography systems that utilize patented Smart Filter technology, exclusively licensed by Intelligent Micro Patterning, LLC from the University of South Florida. Smart...

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Mask Aligners

SUSS MicroTec Receives Multiple Orders from Nemotek Technologie for Wafer-Level Camera Production to Use in Portable Applications

Munich, GERMANY, April 22, 2009 - Nemotek Technologie, a manufacturer of customized wafer-level cameras for portable applications, has selected multiple lithography systems from SUSS MicroTec, a supplier of innovative solutions for the 3D Integration, Advanced Packaging, MEMS and Nanotechnology markets. The deal includes a 200mm production mask aligner, coat, bake and develop systems. The systems...

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Lithography Equipment

EUV Light Source targets HVM testing applications.

Operating at pulse rate of 10 kHz, EQ-10HR produces EUV light suited for infrastructure development for EUV lithography. It incorporates electrodeless Z-Pinch technology, which inductively couples current into discharge plasma, optimizing plasma control and stability and confining plasma away from source components. Product offers simplified integration into process tools and maintains repetition...

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Lithography Equipment

Desktop Nanofabrication System combines DPN, AFM processes.

Utilizing Dip Pen Nanolithography® (DPN®) process, DPN 5000 system offers nanopatterning capabilities coupled with AFM (atomic force microscopy) imaging for immediate characterization of deposited patterns. Various custom MEMS-based ink delivery devices allow range of materials to be deposited under precisely controlled conditions. Included lithography software, InkCAD(TM) 4.0, offers...

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Lithography Equipment

Maskless Lithography System offers scalable functionality.

Providing 1 micron min feature size, SF-100 XPRESS can be custom-configured with various options to meet specific application requirements. Maskless exposure system utilizes Smart Filter technology, which incorporates micro-optical techniques to project master images directly onto diverse substrate materials. Serving researchers and manufacturers in various market segments, system capabilities...

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Lithography System features microfluidics research option.
Lithography Equipment

Lithography System features microfluidics research option.

SF-100 XTREME maskless photolithography system utilizes Smart Filter technology, which incorporates micro-optical techniques to rapidly project master images directly onto diverse substrate materials. Microfluidics Research Option test capabilities include varying excitation and emissions spectra, allowing for gray scale spatial illumination and fluorescence imaging and measuring particles in...

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Photolithography Stepper features high resolution lens.
Lithography Equipment

Photolithography Stepper features high resolution lens.

Based on step-and-repeat technology, Model 8700 PanelPrinter(TM) System features high performance lens that provides up to ±30 ppm real-time magnification adjustment via 6 degree of freedom reticle chuck, allowing every substrate to be compensated for, according to alignment results, ensuring precise alignment. Measuring 3.4 x 2.9 m, system can be configured with either 18709i or 18715i lens...

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Lithography Equipment

Lithography System enables micropatterning of features.

Utilizing Smart Filter technology, which incorporates micro-optical techniques to project master images directly onto diverse substrates, maskless SF-100 XTREME enables micropatterning of features as small as 1 micron. System features precise substrate movement and inline, confocal camera system to optimize overall system results. Users can customize SF-100 XTREME to provide precise energy...

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Lithography Equipment

Lithography System suits hard disk drive applications.

Enabling both development and pilot-production of patterned media applications, Imprio® HD 2200 offers fully automated, double-sided disk patterning and throughput of 180 disks/hr. Step and Flash Imprint Lithography process leverages Drop-on-Demand technology, which places low-viscosity resists only where needed, eliminating waste of consumables. Since S-FIL technology consists of liquid,...

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Optical Filters

Intelligent Micro Patterning Enters South America with SF-100 Sale to Universidad de los Andes, Columbia

JANUARY 15, 2008 Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced the sale of an SF-100 system to the Department of Electrical Engineering at the Universidad de los Andes in Colombia, South America. The SF-100 is a unique, maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning, LLC from the University of South...

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