Heidelberg, Germany, November 23, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Angstrom Microstructure Laboratory of the University of Uppsala, Sweden.
The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm.
"The DWL 200 lithography system will constitute an important upgrade of the in-house mask making and direct writing capabilities at the Angstrom Microstructure Laboratory (MSL). The MST / MEMS activities at this multidisciplinary resource for micro- / nanotechnology and materials science span from life science to space applications, with a critical need for fast turnaround cycles. The new system is equally important to strengthen MSL as a national node for academic mask fabrication in Sweden." States Stefan Nygren, Lab Director of the Angstrom Microstructure Laboratory
About Heidelberg Instruments, GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
Heidelberg Instruments, GmbH