Heidelberg Instruments to Support Nano Research at the University of California, Santa Barbara, Nano Fabrication Facility
Share:
Heidelberg, Germany, November 20, 2006 -- Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Nano Fabrication Facility at the University of California, Santa Barbara.
The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm.
About Heidelberg Instruments, GmbH
With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
Heidelberg Instruments, GmbH
Britta Abler
Email: britta.abler@himt.de
www.himt.de
