Lithography Equipment

Lithography Equipment

EV Group Introduces Roll-To-Roll Nanoimprint Lithography System for Biomedical, Optical, and Flexible Electronics Applications

EVG®570R2R developed with A*STAR IMRE's Industrial Consortium on Nanoimprint (ICON) DRESDEN, Germany – PLASTIC ELECTRONICS – EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced the EVG® 570R2R--the industry's first roll-to-roll thermal nanoimprint lithography (NIL) tool.Â- ...

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Lithography Equipment

Molecular Imprints J-FIL Technology Has Now Demonstrated the Ability to Produce High Performance Wire Grid Polarizers for Use in Flat Panel Displays

- Large area wire grid polarizers with feature sizes of 50nm and below will increase the resolution, reduce the power consumption and lower the cost of a flat panel display AUSTIN, Texas – Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has developed a roll-based Jet and Flash® Imprint Lithography (J-FIL®)...

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Lithography Equipment

Ultratech Secures Repeat AP Order Win with OSAT Customer

Major OSAT Orders Ultratech AP300W for High-volume Advanced Packaging Applications SAN JOSE, Calif. -- Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs) announced that it has received a repeat order from a leading outsourced semiconductor assembly and test (OSAT) company in...

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Panel Lithography System supports advanced packaging.
Lithography Equipment

Panel Lithography System supports advanced packaging.

Capable of processing both glass and organic laminate panels in semiconductor advanced packaging market, JetStep™ features on-the-fly autofocus for thick photoresists, onboard reticle library,Â- and 6 second reticle change out wheel. System can utilize company's suite of software products, including ProcessWORKS® for run-to-run control, Discover® for yield management, and...

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Resist Processing System supports micro- and nano-electronics.
Coating Equipment

Resist Processing System supports micro- and nano-electronics.

Featuring robot with dual arms for accelerated wafer swapping, EVG®120 Automated Resist Processing SystemÂ- supports coating and developing applications for MEMS systems, advanced packaging, and compound semiconductors. Two customizable wet processing bowls are complemented by 10 stacked modules for vapor prime, soft and hard bake, and chill processes. Accommodating...

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Semiconductor Processing Equipment

Rudolph Receives Customer Acceptance of First JetStep System for Advanced Packaging Applications

• Validates commercialization of revolutionary 2X stepper total lithography solution • Flexible substrate handling and large exposure field provide critical benefits in wafer level packaging process Flanders, New JerseyÂ- – Rudolph Technologies, Inc. (NASDAQ: RTEC), a leading provider of process characterization, photolithography equipment and software for the semiconductor, FPD, LED...

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Lithography Equipment

Molecular Imprints Ships Its Next Generation Imprint Module System Targeted for Use in Semiconductor Memory Production

Molecular Imprints will ship three of its next generation imprint systems this quarter.Â-  Two of these systems are expected to be delivered to a leading semiconductor IDM. AUSTIN, Texas– Molecular Imprints, Inc. (MII), a technology leader in advanced semiconductor lithography and the market and technology leader for nanopatterning systems and solutions, today announced the shipment of the...

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Semiconductor Processing Equipment

Brewer Science Presents New Materials, Processes, and Equipment Innovation at SEMICON China and CSTIC

Brewer Science, the inventor of ARC® anti-reflective coatings that have enabled the progress of advanced lithography, continues to deliver diverse technology solutions for FEOL and BEOL device fabrication which will be presented at the China Semiconductor Technology International Conference (CSTIC) and at SEMICON China, 19-21 March 2013, in Shanghai, China. Brewer Science will share...

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Lithography Equipment

Owens Design Collaborates with Leading Nanoimprint Provider to Deliver Advanced, Production-Ready Lithography Tool

FREMONT, Calif. - Owens Design Inc. today announced the completion of a collaborative tool development effort with a leading innovator in the field of nanoimprint technology. The two companies worked closely together to develop and manufacture a production-ready advanced nanoimprint lithography tool that has the ability to process a variety of wafer and substrates sizes. By working with Owens...

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Molecular Imprints, Inc. (MII) Delivers Industry's First 450mm Advanced Lithography System to a Leading Semiconductor Manufacturer in Support of the Global 450mm Initiative
Semiconductor Processing Equipment

Molecular Imprints, Inc. (MII) Delivers Industry's First 450mm Advanced Lithography System to a Leading Semiconductor Manufacturer in Support of the Global 450mm Initiative

MII's J-FIL(TM) Technology Accelerating the Semiconductor Industry's Adoption to 450mm Manufacturing by 2 Years AUSTIN, Texas- Molecular Imprints, Inc., a technology leader in advanced semiconductor lithography, today announced the delivery of the first advanced lithography platform capable of patterning 450mm silicon wafer substrates. The Imprio(®) 450, was accepted by a leading...

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