Pattern Generator can accommodate address grid down to 50 nm.

Press Release Summary:



Suited for high volume production of packaging photomasks, Volume Pattern Generator (VPG) line of large area lithography systems feature exposure speed of over 17,000 mm²/min. Systems can be configured with various stage dimensions designed to accommodate substrate sizes of 1,600 x 1,400, 1,100 x 1,100, and 800 x 800 mm. They can also be equipped with air-bearing stage, semi or fully automatic feeder for substrate loading, and automated resolution exchanging unit.



Original Press Release:



Heidelberg Instruments Introduces the VPG Laser Pattern Generator for High Volume Production of Advanced Packaging Photomasks



Heidelberg, Germany, May 23, 2007: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced introduction of the new Volume Pattern Generator (VPG) line of large area lithography systems, a reliable and an economical solution, ideal for high volume production of today's demanding photomasks in electronic packaging, color filters, and other applications requiring high resolution features on large areas with excellent image quality and registration.

"Based on a patented technology, the VPG is an achievement in innovation and product development from Heidelberg Instruments. With introduction of the VPG, we are providing the fastest and most superior system for production of advanced electronic packaging photomasks, with the lowest cost of ownership" states Alexander Forozan, Heidelberg Instruments Vice President of Global Sales and Business Development

The VPG system can accommodate an address grid down to 50nm, with an exposure speed of over 17000 mm²/min. System can be configured with various stage dimensions designed to accommodate substrate sizes of 1600mm by 1400mm, 1100mm by 1100mm and 800mm by 800mm. These systems can be equipped with air-bearing stage, semi or fully automatic feeder for substrate loading, and automated resolution exchanging unit (Automatic Write Mode), providing an ideal synergy between throughput and minimum feature for various applications

About Heidelberg Instruments, GmbH: With an installation base of more than 270 systems in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of advanced electronic packaging, MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.

Heidelberg Instruments, GmbH
Britta Abler
Email: Britta.abler@himt.de

www.himt.de

All Topics