Lithography Equipment

US Circuit Installs New Maskless DDI Line

Escondido, California: U.S. Circuit, manufacturer of bare printed circuit boards, out of Escondido, California, has installed a MLI-2024 DI (direct imaging) machine, purchased from Maskless Lithography, of San Jose, CA. Ed Carignan, COO of Maskless Lithography, stated, the MLI-2024 machine is a great complement to U.S. Circuit's technology and will provide Mike and his team with a high...

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EUV Light Source targets HVM testing applications.

Operating at pulse rate of 10 kHz, EQ-10HR produces EUV light suited for infrastructure development for EUV lithography. It incorporates electrodeless Z-Pinch technology, which inductively couples current into discharge plasma, optimizing plasma control and stability and confining plasma away from source components. Product offers simplified integration into process tools and maintains repetition...

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Desktop Nanofabrication System combines DPN, AFM processes.

Utilizing Dip Pen NanolithographyÂ-® (DPNÂ-®) process, DPN 5000 system offers nanopatterning capabilities coupled with AFM (atomic force microscopy) imaging for immediate characterization of deposited patterns. Various custom MEMS-based ink delivery devices allow range of materials to be deposited under precisely controlled conditions. Included lithography software, InkCAD(TM) 4.0, offers...

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Maskless Lithography System offers scalable functionality.

Providing 1 micron min feature size, SF-100 XPRESS can be custom-configured with various options to meet specific application requirements. Maskless exposure system utilizes Smart Filter technology, which incorporates micro-optical techniques to project master images directly onto diverse substrate materials. Serving researchers and manufacturers in various market segments, system capabilities...

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Intelligent Micro Patterning Enters South America with SF-100 Sale to Universidad de los Andes, Columbia

JANUARY 15, 2008 Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced the sale of an SF-100 system to the Department of Electrical Engineering at the Universidad de los Andes in Colombia, South America. The SF-100 is a unique, maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning, LLC from the University of South...

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Pattern Generator can accommodate address grid down to 50 nm.

Suited for high volume production of packaging photomasks, Volume Pattern Generator (VPG) line of large area lithography systems feature exposure speed of over 17,000 mmÂ-²/min. Systems can be configured with various stage dimensions designed to accommodate substrate sizes of 1,600 x 1,400, 1,100 x 1,100, and 800 x 800 mm. They can also be equipped with air-bearing stage, semi or fully...

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Heidelberg Instruments to Support MEMS Research at the Institute of Electron Technology, Poland, with an Advanced DWL200 Maskless Laser Lithography System

2006-09-16--Heidelberg, Germany, September 16, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Institute of Electron Technology Warsaw, Poland. The DWL200 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write area of up to 200 mm by 200 mm. The DWL200 maskless lithography...

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Heidelberg Instruments to Support Micro and Nano Research at the Boston University Photonics Center, Boston, USA

Heidelberg, Germany, September 13, 2006: Heidelberg Instruments announced the sale of an advanced DWL66 fs maskless laser lithography system to the Boston University Photonics Center. The DWL66 fs maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce minimum features down to 0.6 microns. The Heidelberg direct write laser system...

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