Deposition Systems

VESTA Announces Multi-Chamber Order for Its VULCAN System to Leading Foundry in Taiwan

Posted: November 27, 2007 VESTA Technology, Inc., a leading supplier of production proven thermal process systems and an industry innovator in atomic layer deposition (ALD), today announced it received a multi-chamber order for its VULCAN(TM) Single wafer High-k and Metal ALD system from the largest leading foundry based in Taiwan. The foundry, a new ALD customer for VESTA, plans to utilize the...

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University of Tuebingen Ready to Produce Carbon Nanotubes on AIXTRON CVD System

Posted: November 28, 2007 AIXTRON AG announced the installation and commissioning of a Nanoinstruments Black Magic 2-inch R&D equipment for carbon nanotube (CNT) growth at the Physics and Chemistry Research Facility, University of Tuebingen, Germany. The new equipment combines both thermal CVD and plasma enhanced CVD in a single platform, and will be used for the development of carbon...

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Veeco MOCVD Tools Selected for ROY HB-LED Capacity Expansion at Xiamen Sanan OptoElectronics in China

WOODBURY, N.Y--Nov. 1, 2007--Veeco Instruments Inc. (Nasdaq: VECO), announced today that two recently purchased TurboDiscÂ-® E450(TM) As/P Metal Organic Chemical Vapor Deposition (MOCVD) Systems are being used by Xiamen Sanan OptoElectronics of Xiamen, China to expand their capacity of red, yellow and orange (ROY) high brightness light emitting diodes (HB-LEDs). Mr. Kechuang Lin, General...

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First Nano Ships Boron Nitride Nano Tube System to Center for Functional Nanomaterials @ Brookhaven National Laboratory

RONKONKOMA, N.Y., Jan. 10 - First Nano, a division of CVD Equipment Corporation (NASDAQ:CVV), announced today the shipment of an ET3000-BN Chemical Vapor Deposition System to the Center for Functional Nanomaterials (CFN) at Brookhaven National Laboratory (BNL). The ET3000-BN system was configured specifically for Boron Nitride Nanotubes (BNNT's) and is, to the best of our knowledge, the first...

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Novellus Systems Introduces Ashable Hard Mask Process Technology on VECTOR Express Platform

New Film To Address Advanced 193nm High Aspect Ratio Patterning Etch Requirements SAN JOSE, Calif., June 25 / / -- Novellus Systems, Inc. (NASDAQ:NVLS) announced today that it has started production shipments of its new patent-pending ashable hard mask (AHM(TM)) process technology on the VECTOR Express(TM) plasma-enhanced chemical vapor deposition (PECVD) platform. Designed to address the...

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BOC Edwards and Aviza Technology Announce Joint Development Agreement for Atomic Layer Deposition

JDA Combines BOC Edwards' Expertise in Chemical Precursor Formulation with Aviza's ALD Hardware Technology to Enhance Utilization, Throughput and Reduce Process Cost WILMINGTON, MASS. and SCOTTS VALLEY, CALIF. (30 October 2006)-BOC Edwards, a leading supplier of technology, equipment and support services to the electronics and microelectronics industries, and Aviza Technology, Inc. (NASDAQ:...

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Surface Engineering Platform uniformly coats substrates.

Using liquid precursor which is atomized and sprayed into plasma jet, PlasmaStream(TM) coats surfaces to provide characteristics such as adhesion, waterproofing, low-friction slickness, or anti-microbial properties. Suitable for manufacturers of 3D, rigid, or molded parts, platform eliminates need for drying and curing; works at room temperature; requires no solvents, surfactants, or water; and...

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sp3 Launches Lower Priced Diamond Deposition Development System

SANTA CLARA, Calif., Nov. 15 / -- sp3 Diamond Technologies, Inc., a leading supplier of diamond film products, equipment and services, today introduced its sp3 Model 250 Hot Filament CVD Reactor. The Model 250 is designed for deposition of high-quality diamond films on various substrates in research organizations. A low cost platform, the Model 250 allows an educational R&D facility to utilize...

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Vacuum Coating System suits thin film deposition processes.

Vacuum Coating System suits thin film deposition processes.

Designed for production of substrates used in semiconductor, laser, and scientific industries, custom-built TF600 has 600 mm wide coating chamber with vacuum pumping system in rear. Pumping system options include diffusion, turbomolecular, and cryogenic high vacuum pumps as well as XDS 35i dry scroll pump for backing and chamber roughing. Process options include resistance evaporation, electron...

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