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Latest New Product News from
Kurt J. Lesker Co.
NANO 36™ Thin Film Deposition System is designed for use within the controlled atmosphere of a glove box. Featuring multiple substrate fixture options, system comes with enhanced deposition capabilities and substrate platen options. NANO 36™ is suitable for glovebox integration.Read More
IMPULSE™ 2-2 Pulsed Power Module is available in single and dual configurations. Enabling high-power impulse magnetron sputtering (HiPIMS), the unit offers both front panel and remote control options with up to five user-selectable storage presets. Module’s positive kick function increases deposition rate, clearing charges and broadens the process envelope. The dual configuration model can... Read More
Offered in Single and Dual configurations, the IMPULSE’s HiPIMS Power Supply gives 2kW output. Ideally used in process development and RD applications, HiPIMS' dual configuration powers 2 independent sources of up to 2kW each. Units can be set for either “master” or “slave” mode to run 4kW into a single source. Using the Dual option, the DC bias option can be set. Power supply... Read More
Designed to meet requirements of R&D community, TorusÂ® Mag Keeper™ includes quick target change feature, optimized cooling design, and low operating pressure capability. Circular magnetron sputtering source is engineered with no O-rings and all ceramic insulators. For magnetic film deposition, Mag Keeper offers high-strength magnet options for sputtering up to 3 mm thick Fe. Product comes in... Read More
Rated up to 2 million cycles and available with 200-3,000 mm openings, bellows-sealed Rectangular Gate Valves feature L-Motion link assembly and dual shafts without springs in actuator to enable smooth actuation with minimal vibration. Dust Seal on vacuum side of bonnet flange virtually eliminates process particulate from entering bellows. At end of blade travel during valve closure, valves lock... Read More
Taking less than 0.3 seconds to close, Protection Vacuum Gate Valve protects in-process products in event of vacuum pump failure. Bellows-sealed, pneumatically actuated, SS valve system monitors up to 4 pumps with local or remote control and LCD status display. Internal mechanism has low particle generation design and is shielded in open and closed positions against particulate accumulation,... Read More
Model CVF 1000 Ultra High, Clean Vacuum Furnace is designed for degassing and conditioning components that are used inside vacuum environment to reduce outgassing and pumpdown time. It features 24 in. wide x 30 in. high x 24 in. deep SS water cooled chamber with hinged front door, high vacuum cryogenic pumping, molybdenum and inconel hot zone, full computer control with data logging, and... Read More
Available in tall and low profile versions, LION(TM) Series Ion Pumps are available with pumping ranges from 3-800 L/s. Standard diode and noble diode elements are complemented by Noble 30 option, which combines diode pumping element with noble gas capabilities. Three controllers are offered with RS232 as standard I/O, and provide ability to control up to 4 pumps simultaneously. Read More
Providing modular alternative to error-prone analog pressure measurement, TRUE Digital(TM) Gauges include Piezo, Piezo/Pirani, Pirani, and Pirani/Bayard-Alpert units, which cover pressure range from 1,500 to 7.5 x 10-9 Torr. Design permits data to be read directly into PLC or PC with no signal conversions required. Gauges may be daisy-chained using RS485 cables. Profibus, DeviceNet,... Read More
Single-stage, 4.2 cfm ULVAC Model DISL-100 fills ultimate pressure void left between diaphragm pumps, which are typically rated at 1.5 Torr, and 2-stage scroll pumps down to 7.5 milliTorr. Single-stage scroll design optimizes vapor handling and enables higher continuous inlet pressure performance compared to 2-stage models. Read More
Modular M.A.P.S. Power Supplies are available with computer-driven as well as manual switching networks that enable single supply to drive several sources. Model HTR is suited for process heating applications, while Model EVP is used for basic thermal evaporation applications. Model HTE is for high temperature evaporation, typically used with furnace style source, and Model LTE suits low... Read More
AXXIS modular, thin-film deposition tool supports processes such as sputtering, thermal evaporation, electron beam evaporation, PECVD plasma, and ion cleaning. It can heat, cool, and rotate variety of substrates and is offered in both manual and computer controlled versions. Read More
SHPS8KW closed loop power supply and digital temperature controller powers all types of heaters including PGG or PBN Button Substrate Heaters. When used with Neocera heater assembly, it provides stability of better than Â±1Â°C. Unit features 8 kW output power, Watlow Series 145 temperature limit with LED output status indicators, Type-K thermocouple, and SCR protection via 3 rear panel fuses. Read More
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Kurt J. Lesker Co.