Metallurgical Microscope provides QC and failure analysis.
Press Release Summary:
Axiovert 200 MAT inverted metallurgical microscope features enhanced contrast Epiplan Neofluar series of objectives, 6-position nosepiece, and 5-position reflector turret for push-and-click exchange of filters. Magnification and stage control settings can be programmed and viewed via LCD display. Light Manager stores and monitors up to 30 different levels of illumination, while integrated focus stop protects objective and specimens from accidental damage.Original Press Release:
Axiovert 200 MAT Metallurgical Microscope for Maximum Performance & Flexibility
Thornwood, NY - Carl Zeiss has introduced an Axiovert 200 MAT
inverted microscope for materials R&D, quality control and failure analysis. Designed specifically for the industrial market, the Axiovert 200 MAT is a powerful combination of high-performance optics, Zeiss' exclusive innovative techniques, unshakable stability and ease of use. It is ideal for structure, grain size, and particle analysis, pore and crack testing, step height measurement, surface analysis and more.
New Enhanced Contrast (EC) Epiplan Neofluar series of objectives
make the most of what optics have to offer. Transmission,
homogeneity and correction have been tailored to the materials
applications requirements for a significant increase in precision, color fidelity, outstanding contrast and performance.
All microscope settings from magnification to stage control can be easily programmed and viewed via an LCD display. Some of the
other new features include a 6 position nosepiece for comfort and convenience; a 5 position reflector turret for easy push and click exchange of filters; Light Manager that stores and monitors up to 30 different levels of illumination; an integrated Focus Stop to protect the objective and specimens from accidental damage.
Axiovert 200 MAT is equipped for all important measuring
techniques in x, y and Z from micrometer to nanometer range with
interferometric measurements. Zeiss' exclusive C-DIC interference contrast & TIC dual-beam interferometer techniques bring a new dimension of quality in displaying structures & defects.
For more information contact Carl Zeiss Microimaging, Inc.,
Thornwood, NY 10594, 800-233-2343, www.zeiss.com/materials, or
email at micro@zeiss.com.
