Press Release Summary:
Designed to address challenges of mask manufacturing of 193i Optical Immersion and Extreme Ultraviolet Lithography, MaskTrack Pro Bake/Develop brings together ASonicÂ® develop technology with Post-Exposure Bake regime for CD uniformity matching, crucial to sub 22 nm DPT production. Designed to equalize develop rate, independent of feature size and pattern loading, ASonic approach minimizes dark loss effects and removes risk of pattern damage/collapse for optimal pattern fidelity results.
Original Press Release:
SUSS MicroTec Launches MaskTrack Pro® Bake/Develop for Next Generation Lithography
Garching, GERMANY, - Today, HamaTech APE GmbH & Co. KG, a wholly owned subsidiary of SÜSS MicroTec AG, introduced the latest addition to its Next Generation Lithography line of mask integrity platforms, the MaskTrack Pro Bake/Develop (BD). The product addresses the challenges of mask manufacturing of advanced 193i Optical Immersion and Extreme Ultraviolet Lithography (EUVL).
The MaskTrack Pro BD brings together a unique ASonic® develop technology with a sophisticated Post-Exposure Bake regime for perfect CD uniformity matching, crucial to sub 22nm DPT and future production challenges of advanced lithography. Designed to equalize the develop rate, independent of feature size and pattern loading, the ASonic approach minimizes dark loss effects and removes the risk of pattern damage/collapse for unrivaled pattern fidelity results. The new MaskTrack Pro BD introduces an exclusive Mirror-Bake regime for maximum Post-Exposure Bake uniformity at mask level while enabling system level matching of temperature, recipe and performance. With its distinctive approach to mask integrity, the MaskTrack Pro BD high precision transfer of exposed image to final mask pattern, offers customers a distinctive increase mask yield.
"Our customers asked for equipment to eliminate Next Generation Lithography barriers to entry and we answered with the launch of the Mask Track Pro cleaning platform in 2009," said Wilma Koolen-Hermkens, Chief Executive Officer of HamaTech. "Encouraged by overwhelming customer response, we have extended our Next Generation Lithography mask integrity product line to include critical bake and develop technology."
"We believe that mask integrity is a key proponent to the successful adoption of advanced lithography. At point-of-exposure, without a pristine, defect-free mask, the probability of yield loss on Next Generation Lithography processes will be a fact," added Frank P. Averdung, President and CEO of SUSS MicroTec. "With the complementation of the photomask processing product line, SUSS MicroTec extends its market leadership in Next Generation Lithography equipment."
The first MaskTrack Pro BD will ship to Asia by the end of this year.
To meet with our experts and discuss the new system please visit us at Semicon West 2010 July 13 - 15th at booth 1707 in San Francisco, California.