US Circuit Installs New Maskless DDI Line
Escondido, California: U.S. Circuit, manufacturer of bare printed circuit boards, out of Escondido, California, has installed a MLI-2024 DI (direct imaging) machine, purchased from Maskless Lithography, of San Jose, CA. Ed Carignan, COO of Maskless Lithography, stated, the MLI-2024 machine is a great complement to U.S. Circuit's technology and will provide Mike and his team with a high...
Read More »EUV Light Source targets HVM testing applications.
Operating at pulse rate of 10 kHz, EQ-10HR produces EUV light suited for infrastructure development for EUV lithography. It incorporates electrodeless Z-Pinch technology, which inductively couples current into discharge plasma, optimizing plasma control and stability and confining plasma away from source components. Product offers simplified integration into process tools and maintains repetition...
Read More »Desktop Nanofabrication System combines DPN, AFM processes.
Utilizing Dip Pen NanolithographyÃ-® (DPNÃ-®) process, DPN 5000 system offers nanopatterning capabilities coupled with AFM (atomic force microscopy) imaging for immediate characterization of deposited patterns. Various custom MEMS-based ink delivery devices allow range of materials to be deposited under precisely controlled conditions. Included lithography software, InkCAD(TM) 4.0, offers...
Read More »Maskless Lithography System offers scalable functionality.
Providing 1 micron min feature size, SF-100 XPRESS can be custom-configured with various options to meet specific application requirements. Maskless exposure system utilizes Smart Filter technology, which incorporates micro-optical techniques to project master images directly onto diverse substrate materials. Serving researchers and manufacturers in various market segments, system capabilities...
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Advantages of Thermoset Plastics vs. Engineered Thermoplastics and Metal Parts
Thermosets and engineered thermoplastics are sometimes better suited to differing situations, but they do have some overlap in relevant use cases.
Read More »Intelligent Micro Patterning Enters South America with SF-100 Sale to Universidad de los Andes, Columbia
JANUARY 15, 2008 Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced the sale of an SF-100 system to the Department of Electrical Engineering at the Universidad de los Andes in Colombia, South America. The SF-100 is a unique, maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning, LLC from the University of South...
Read More »Rohm and Haas Electronic Materials Invests $60 Million in 193nm Immersion Lithography System
MARLBOROUGH, Mass., June 26 / - Rohm and Haas Electronic Materials (NYSE:ROH) will invest $60 million in leading edge lithography equipment to support its extensive research and development of advanced 193 nanometer (nm) photoresist and anti-reflective coatings used in the manufacture of semiconductor devices. As a leading material supplier to the semiconductor industry, our ability to deliver...
Read More »Pattern Generator can accommodate address grid down to 50 nm.
Suited for high volume production of packaging photomasks, Volume Pattern Generator (VPG) line of large area lithography systems feature exposure speed of over 17,000 mmÃ-²/min. Systems can be configured with various stage dimensions designed to accommodate substrate sizes of 1,600 x 1,400, 1,100 x 1,100, and 800 x 800 mm. They can also be equipped with air-bearing stage, semi or fully...
Read More »Heidelberg Instruments to Support Nano Research at the University of California, Santa Barbara, Nano Fabrication Facility
Heidelberg, Germany, November 20, 2006 -- Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Nano Fabrication Facility at the University of California, Santa Barbara. The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm. About Heidelberg Instruments, GmbH...
Read More »Heidelberg Instruments to Support Micro and Nano Research at the University of Uppsala, Sweden
Heidelberg, Germany, November 23, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Angstrom Microstructure Laboratory of the University of Uppsala, Sweden. The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm. The DWL 200 lithography system will...
Read More »Heidelberg Instruments, Gmbh, Announces the Receipt of a Repeat Order for an Advanced Mask Write System by a Chinese Based Mask Supplier
Heidelberg, Germany, November 16, 2006: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the order for an advanced MW800fs system by Shenzhen New Way Electronic Co., LTD., Shenzhen, China. Founded in 1997, Shenzhen New Way Electronic Co., LTD concentrates on production of advanced photomasks in the areas of LCD, PCB and...
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Precision Machined Parts for High Tech Applications
For precision and value that sets the standard for quality and craftsmanship, EGS Production Machining is the source for precision and value. Our extensive capabilities and dedication to customer service allow us to deliver the optimal manufacturing solution. See our video to learn more.
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