Clear Shape Technologies, Inc.
Santa Clara, CA 95054
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Software checks full-chip design manufacturability.
InShape(TM) predicts accurate silicon shapes, enabling designers to perform DFM hotspot detection of catastrophic failures. This model-based Design Manufacturability Checker utilizes nonlinear optical transformation algorithm to detect potential manufacturing failures during physical design. Compact models encapsulate all necessary RET, OPC, mask, etch, and lithography effects on both device and...
Read More »Electrical DFM Solution aids chip analysis and optimization.
Offered as complete and silicon correlated solution, OutPerform(TM) lets designers using sub-90 nm processes optimize and control impact of lithography, mask, etch, RET, OPC, and CMP effects on their chip parameters. It plugs directly into existing flows for cell design, IP, custom analog, and cell-based digital design. After identifying timing and leakage parametric hotspots for violations,...
Read More »Clear Shape Partners with STARC to Develop Comprehensive DFM Flow
Clear Shape's Fast and Accurate Full-Chip Systematic Variability Analysis Product InShape Will Be Used in Variability-Aware DFM Flows SANTA CLARA, Calif., Jan. 17 -- Clear Shape Technologies, Inc., a leader in variability-aware analysis and optimization solutions, today announced a partnership with Semiconductor Technology Academic Research Center (STARC), Japan's leading semiconductor technology...
Read More »Software checks full-chip design manufacturability.
InShape(TM) predicts accurate silicon shapes, enabling designers to perform DFM hotspot detection of catastrophic failures. This model-based Design Manufacturability Checker utilizes nonlinear optical transformation algorithm to detect potential manufacturing failures during physical design. Compact models encapsulate all necessary RET, OPC, mask, etch, and lithography effects on both device and...
Read More »Electrical DFM Solution aids chip analysis and optimization.
Offered as complete and silicon correlated solution, OutPerform(TM) lets designers using sub-90 nm processes optimize and control impact of lithography, mask, etch, RET, OPC, and CMP effects on their chip parameters. It plugs directly into existing flows for cell design, IP, custom analog, and cell-based digital design. After identifying timing and leakage parametric hotspots for violations,...
Read More »Clear Shape Debuts with Comprehensive Variability Platform Enabling Entitled Design Performance and Yield
Model-based solutions and key underlying technologies silicon verified by several customers SANTA CLARA, Calif., Nov. 27 /PRNewswire/ -- Clear Shape Technologies, Inc. formally introduced itself today as a DFM solutions provider delivering variability solutions that enable chip designers to control and optimize the parametric and catastrophic impact of systematic manufacturing variations. After 3...
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