Molecular Imprints, Inc.
Austin, TX 78758-3605
Feb 27, 2008 Leveraging S-FIL® (Step and Flash Imprint Lithography) technology, Imprio® 300 is used for IC prototyping and process development at 32 nm node and beyond. It offers sub-10 nm resolution patterning in single exposure and can create dense, high-resolution structures in 2 dimensions. Drop-in technology - suitable for mix-and-match strategies where resolution advantage can be deployed on specific critical layers - is capable of meeting overlay requirements of semiconductor industry.

Photo Sciences, Inc.
Torrance, CA 90505
Oct 25, 2007 Photo Sciences uses multi-faceted micro lithography capabilities to pattern Indium Tin Oxide (ITO) coated substrates using direct-write laser, direct-write e-beam, optical reduction, and full field exposure lithography. Multi-level aligners expose and selectively etch other thin film metals and dielectrics, which can be layered with ITO patterns to create array of circuit and display configurations. Measurement and test equipment ensure that coatings meet thickness and resistance specifications.

Luminescent Technologies, Inc.
Mountain View, CA 94041
Jan 03, 2006 Acting as replacement for Resolution Enhancement Technology (RET) software, Explorer uses Inverse Lithography Technology (ILT) platform to evaluate desired on-wafer pattern and mathematically determine mask features needed to produce intended silicon outcome. ILT analyzes entire image and generates globally optimized mask design in single pass. Combining software and hardware, Explorer features selectable e-beam or laser mask output format.

NanoInk, Inc.
Chicago, IL 60607
Nov 09, 2004 Active™ Pen Array transforms NSCRIPTOR System into multi-pen plotter for nanoscale. Each probe in array is addressable and able to move individually in Z-direction while scanning and writing. Active Pen includes microfabricated pens, electronics and interconnect modules, and alignment software. Each pen array consists of 8-pen configuration, having 6 central writing pens and 2 flanking reader probes. InkCAD™ v3.0 software facilitates nanoscale tip-to-tip alignment.

NanoInk, Inc.
Chicago, IL 60607
May 26, 2004 NSCRIPTOR™, suited for fabrication of nanoscale electronic components, incorporates bias control option that delivers functional capability of creating electric field between probe tip and sample substrate. This allows researcher to perform oxidation nanolithography and enables deposition of conductive nanoscale structures onto semiconductor surfaces via electrochemical Dip Pen Nanolithography™ (DPN™) methods. System also incorporates multi-pen writing arrays.

NanoInk, Inc.
Chicago, IL 60607
May 21, 2003 NSCRIPTOR™ DPNWriter™ system allows researchers to build patterns, layers, and structures with virtually any molecule, at resolutions less than 15 nm with spacing as close as 5 nm. System includes closed-loop scanning with low thermal drift, 3-point leveling between scanning plane and sample, and InkCAD control for design, writing, and imaging capability. Environmental Chamber provides integrated temperature and humidity control.

Asylum Research
Santa Barbara, CA 93117
Nov 12, 2002 MFP-3D® AFM System consists of digital controller, Igor Pro software, and Nanopositioning system. With MicroAngelo feature, system allows nanolithography images to be imported from other programs or generated within software environment. Imported images are converted into series of contour lines which are then scaled and used to drive scanner to create lithographic image. Sensored, closed loop operation in all 3 axes provides sub-nanometer resolution over entire 100 µm scan range.