EV Group Inc.
Tempe, AZ 85284
Jul 22, 2009 UV-nanoimprint lithography (UV-NIL) step and repeat system, EVG770 Gen II NIL Stepper, incorporates abilities that promote process reliability, accuracy, and pattern fidelity at decreasing feature densities. While vacuum imprinting on spun-on polymer layer eliminates defect issues caused by trapped air bubbles, optical sensors align stamp and wafer into perfect parallelism for contact-free wedge compensation. Chuck movement, via non-contact bearing system, reduces particle contamination.

Pemco Inc.
Sheboygan, WI 53082
Mar 26, 2009 Providing optimal decurler capability, T.I.P. WEB-0401 features heavy duty 3-bar motorized roller decurler assembly. Available in 12, 20, 30, 40, 50, and 75 mm dia, diameter of 3 decurler bars depend on machine/product details. Decurler needed for converting dedicated product can be selected by moving pin and rotating assembly using supplied handle and then reinserting pin to lock it. With remote adjustment, unit has less or no product markings.

Energetiq Technology
Woburn, MA 01801
Mar 06, 2009 Operating at pulse rate of 10 kHz, EQ-10HR produces EUV light suited for infrastructure development for EUV lithography. It incorporates electrodeless Z-Pinch technology, which inductively couples current into discharge plasma, optimizing plasma control and stability and confining plasma away from source components. Product offers simplified integration into process tools and maintains repetition rate over billions of pulses.

NanoInk, Inc.
Chicago, IL 60607
Feb 24, 2009 Utilizing Dip Pen Nanolithography® (DPN®) process, DPN 5000 system offers nanopatterning capabilities coupled with AFM (atomic force microscopy) imaging for immediate characterization of deposited patterns. Various custom MEMS-based ink delivery devices allow range of materials to be deposited under precisely controlled conditions. Included lithography software, InkCAD(TM) 4.0, offers functionality for control of tip-based patterning along with nanoscale mapping and positioning.

Intelligent Micro Patterning, LLC
St. Petersburg, FL 33703
Feb 04, 2009 Providing 1 micron min feature size, SF-100 XPRESS can be custom-configured with various options to meet specific application requirements. Maskless exposure system utilizes Smart Filter technology, which incorporates micro-optical techniques to project master images directly onto diverse substrate materials. Serving researchers and manufacturers in various market segments, system capabilities may be added as dictated by technical requirements.

Intelligent Micro Patterning, LLC
St. Petersburg, FL 33703
Oct 08, 2008 SF-100 XTREME maskless photolithography system utilizes Smart Filter technology, which incorporates micro-optical techniques to rapidly project master images directly onto diverse substrate materials. Microfluidics Research Option test capabilities include varying excitation and emissions spectra, allowing for gray scale spatial illumination and fluorescence imaging and measuring particles in flow, including creating particle image velocimetry like conditions.

Azores Corp
Wilmington, MA 01887
Sep 25, 2008 Based on step-and-repeat technology, Model 8700 PanelPrinter(TM) System features high performance lens that provides up to ±30 ppm real-time magnification adjustment via 6 degree of freedom reticle chuck, allowing every substrate to be compensated for, according to alignment results, ensuring precise alignment. Measuring 3.4 x 2.9 m, system can be configured with either 18709i or 18715i lens with resolution of 2.5 and 1.5 µm and depth of focus of 30 and 9 µm, respectively.

Intelligent Micro Patterning, LLC
St. Petersburg, FL 33703
Jul 14, 2008 Utilizing Smart Filter technology, which incorporates micro-optical techniques to project master images directly onto diverse substrates, maskless SF-100 XTREME enables micropatterning of features as small as 1 micron. System features precise substrate movement and inline, confocal camera system to optimize overall system results. Users can customize SF-100 XTREME to provide precise energy levels, exposure wavelengths, and minimum feature sizes for application.

Molecular Imprints, Inc.
Austin, TX 78758-3605
Feb 27, 2008 Leveraging S-FIL® (Step and Flash Imprint Lithography) technology, Imprio® 300 is used for IC prototyping and process development at 32 nm node and beyond. It offers sub-10 nm resolution patterning in single exposure and can create dense, high-resolution structures in 2 dimensions. Drop-in technology - suitable for mix-and-match strategies where resolution advantage can be deployed on specific critical layers - is capable of meeting overlay requirements of semiconductor industry.

Photo Sciences, Inc.
Torrance, CA 90505
Oct 25, 2007 Photo Sciences uses multi-faceted micro lithography capabilities to pattern Indium Tin Oxide (ITO) coated substrates using direct-write laser, direct-write e-beam, optical reduction, and full field exposure lithography. Multi-level aligners expose and selectively etch other thin film metals and dielectrics, which can be layered with ITO patterns to create array of circuit and display configurations. Measurement and test equipment ensure that coatings meet thickness and resistance specifications.

Luminescent Technologies, Inc.
Mountain View, CA 94041
Jan 03, 2006 Acting as replacement for Resolution Enhancement Technology (RET) software, Explorer uses Inverse Lithography Technology (ILT) platform to evaluate desired on-wafer pattern and mathematically determine mask features needed to produce intended silicon outcome. ILT analyzes entire image and generates globally optimized mask design in single pass. Combining software and hardware, Explorer features selectable e-beam or laser mask output format.

NanoInk, Inc.
Chicago, IL 60607
Nov 09, 2004 Activeâ„¢ Pen Array transforms NSCRIPTOR System into multi-pen plotter for nanoscale. Each probe in array is addressable and able to move individually in Z-direction while scanning and writing. Active Pen includes microfabricated pens, electronics and interconnect modules, and alignment software. Each pen array consists of 8-pen configuration, having 6 central writing pens and 2 flanking reader probes. InkCADâ„¢ v3.0 software facilitates nanoscale tip-to-tip alignment.

NanoInk, Inc.
Chicago, IL 60607
May 26, 2004 NSCRIPTORâ„¢, suited for fabrication of nanoscale electronic components, incorporates bias control option that delivers functional capability of creating electric field between probe tip and sample substrate. This allows researcher to perform oxidation nanolithography and enables deposition of conductive nanoscale structures onto semiconductor surfaces via electrochemical Dip Pen Nanolithographyâ„¢ (DPNâ„¢) methods. System also incorporates multi-pen writing arrays.

NanoInk, Inc.
Chicago, IL 60607
May 21, 2003 NSCRIPTORâ„¢ DPNWriterâ„¢ system allows researchers to build patterns, layers, and structures with virtually any molecule, at resolutions less than 15 nm with spacing as close as 5 nm. System includes closed-loop scanning with low thermal drift, 3-point leveling between scanning plane and sample, and InkCAD control for design, writing, and imaging capability. Environmental Chamber provides integrated temperature and humidity control.

Asylum Research
Santa Barbara, CA 93117
Nov 12, 2002 MFP-3D® AFM System consists of digital controller, Igor Pro software, and Nanopositioning system. With MicroAngelo feature, system allows nanolithography images to be imported from other programs or generated within software environment. Imported images are converted into series of contour lines which are then scaled and used to drive scanner to create lithographic image. Sensored, closed loop operation in all 3 axes provides sub-nanometer resolution over entire 100 µm scan range.