EUV Light Source targets HVM testing applications.March 6, 2009 -
Operating at pulse rate of 10 kHz, EQ-10HR produces EUV light suited for infrastructure development for EUV lithography. It incorporates electrodeless Z-Pinch technology, which inductively couples current into discharge plasma, optimizing plasma control and stability and confining plasma away from source components. Product offers simplified integration into process tools and maintains repetition rate over billions of pulses.
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Original Press release
Energetiq Technology
7 Constitution Way
Woburn, MA, 01801
USA
Energetiq Introduces High Repetition Rate EUV Light Source
10 kHz Source Enables High Volume Manufacturing (HVM) Simulation
WOBURN, Mass., Feb. 23 / / - Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for advanced technology applications, announced today that it has developed a new EUV light source, the EQ-10HR that operates at a high pulse rate of 10 kHz to simulate the requirements of high volume manufacturing (HVM) for EUV lithography (EUVL) implementation. Energetiq will exhibit this new technology at SPIE Advanced Lithography in San Jose, CA, February 24-25, 2009.
EUV sources for HVM are expected to operate at pulse repetition rates of 10 kHz or higher. To simulate the effects of operating at such pulse rates on the optics lifetime, for example, high repetition rate metrology sources are needed. Energetiq addresses this need with the new EQ-10HR EUV Source that operates at a 10 kHz pulse rate. The EQ-10HR is based upon Energetiq's innovative EQ-10 EUV Source design, which has become an industry standard EUV metrology source since its introduction in 2005. The original EQ-10 was designed to operate at a pulse frequency of 1 to 2 kHz - a repetition rate below HVM requirements--and its fundamental principle of operation, the Electrodeless Z-Pinch(TM), has been employed in the EQ-10HR high pulse rate source. Energetiq's patented Electrodeless Z-Pinch technology inductively couples the current into the discharge plasma, making the plasma extremely stable and controllable. The plasma is confined away from source components, reducing debris and allowing very long operating life and very low cost of ownership.
"We are very excited to bring about a reliable, cost-effective solution for producing EUV light in HVM testing," said Debbie Gustafson, Energetiq's Vice President of Sales and Service. "Our electrodeless technology is proven to produce EUV light that's ideal for infrastructure development for EUV lithography as evidenced by the large number of Energetiq EQ-10 EUV systems installed in processing tools around the globe. With the introduction of the higher repetition rate EQ-10HR, we can further enable the advancement of EUV as the next HVM lithography technique."
The EQ-10HR integrates easily into process tools and will run continuously at pulse repetition rates of 10 kHz for many billions of pulses.
About Energetiq
Energetiq Technology, Inc. is a developer and manufacturer of advanced short wavelength light products that enable nano-scale structures and products. The Energetiq team combines its deep understanding of the high power plasma physics needed for short wavelength light generation with its long experience in building rugged, industrial and scientific products. The result is that users can expect the highest levels of performance combined with the highest reliability.
Source: Energetiq Technology, Inc.
CONTACT: Debbie Gustafson, Energetiq Technology, Inc., +1-781-939-0763, dgustafson@energetiq.com
Web Site: http://www.energetiq.com/
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