Atomic Force Microscope supports tapping mode imaging.
April 29, 2014 -
Featuring 90 µm stage, MFP-3D Infinity AFM includes Fast Force Curve Mapping mode, which operates at up to 300 Hz pixel rate, capturing every force curve in image without missing curves or performing hidden data manipulation. Real-time and offline analysis models calculate modulus, adhesion, and other properties. To maximize productivity, GetStarted automatically sets tapping mode imaging parameters such as setpoint, gain, and scan rate based on sample roughness and cantilever calibration.
Oxford Instruments Asylum Research Introduces the MFP-3D Infinity(TM) AFM Featuring Powerful New Capabilities and Stunning High Performance
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Press release date: April 16, 2014
Santa Barbara, CA — Oxford Instruments Asylum Research announces the new MFP-3D Infinity Atomic Force Microscope (AFM). The MFP-3D Infinity is the new flagship of the Asylum Research MFP-3D™ AFM family with dramatic performance improvements, new nanomechanical measurement capabilities, and new features that make it simple to get started with tapping mode imaging. Whether you are doing routine imaging tasks or ambitious research projects, the MFP-3D Infinity is ideal for an endless variety of applications with unlimited potential for your research.
“The MFP-3D Infinity has evolved extensively from the original MFP-3D that pioneered closed loop scanning and low noise AFM measurements,” commented Dan Bocek, Project Manager. “The development team used their superior knowledge of AFM physics and technology to accomplish truly remarkable performance improvements. We reduced the XY sensor noise by 70% and slashed the Z sensor noise by more than 85%. Overall system height noise is now only 20pm, a third of what it was on the original MFP-3D. The practical benefit is that our customers can now achieve higher resolution while still enjoying the unmatched versatility of the MFP-3D family. No other AFM beats this combination of performance and flexibility.”
Jason Bemis, Manager, High-level Software, added, “We’ve also introduced new software features that showcase the potential of this new hardware and enhance the capability and greatly improve the ease of use of the new Infinity AFM. Our new Fast Force Curve Mapping mode enables the high speed capture and analysis of force-distance curves. We’ve also developed a new feature called GetStarted™ that does exactly what it says. It helps users get high quality tapping mode images from the very start.”
The MFP-3D Infinity features a large 90µm stage and entirely new control electronics that are located close to the AFM for fast, low noise performance. Flexible signal switching and programmable logic enable future expansion options. The new head and scanner offer greatly improved sensor noise (<35pm in Z and <150pm in X&Y) and higher bandwidth for improved force control and faster imaging. Top and bottom view optics provide a large field of view and diffraction-limited resolution for pinpointing features on your sample.
GetStarted greatly increases AFM productivity. It is an intuitive new feature that automatically sets tapping mode imaging parameters such as setpoint, gain, and scan rate based on your sample roughness and cantilever calibration. Unlike iterative optimization schemes, GetStarted uses a robust predictive algorithm so that accurate data is produced from the very first scan line without the potential of tip and sample damage that is common with other optimization routines that assist with scanning.
The new Fast Force Mapping mode brings Asylum’s market leadership and expertise in force spectroscopy to fast force-distance curves measurements. Operating at up to 300Hz pixel rate, it captures every force curve in the image without missing curves or performing hidden data manipulation. Realtime and offline analysis models calculate modulus, adhesion and other properties, and are user-accessible. Part of the NanomechPro™ Toolkit, Fast Force Mapping is a technique complementary to AM-FM Viscoelastic Mapping mode and Contact Resonance Viscoelastic Mapping Mode.
The MFP-3D Infinity remains compatible with the full range of MFP-3D accessories. No other AFM in the world supports such a wide range of innovative accessories, both practical and unique, for temperature and environmental control, controlled gas or liquid environments and for experiments using external driving forces – ideal for busy multi-user facilities.
Additional information on the MFP-3D Infinity and its entire range of new capabilities, scan techniques, and accessories can be found at www.AsylumResearch.com/Infinity. To receive a quotation, email us at sales@AsylumResearch.com
About Oxford Instruments Asylum Research
Oxford Instruments Asylum Research is the technology leader in atomic force microscopy for both materials and bioscience research. Asylum Research AFMs are used for a wide variety of nanoscience applications in material science, physics, polymers, chemistry, tribology, biomaterials, and bioscience, including emerging applications in energy storage and generation, low-dimensional materials, and biophysics.
Asylum’s MFP-3D™ family of AFMs includes four different models that span a wide range of performance, applications, and budgets. The new MFP-3D Infinity is the flagship of the family, offering the highest performance, simplest operation, and widest range of capabilities. The MFP-3D Classic, the original MFP-3D offered for mid-range budgets, provides high performance and versatility that exceeds most AFMs. The MFP-3D Origin is the most affordable model, offering the same performance as the MFP-3D Classic with many accessories and an easy upgrade path to advanced capabilities. Finally, the MFP-3D-BIO integrates with an inverted light microscope to support biological and photonic applications.
Cypher™ is the highest resolution fast scanning AFM and is available in two configurations, the Cypher S and the Cypher ES Environmental AFM. They provide low-drift closed loop imaging for the most accurate images and measurements possible today, >20X faster imaging with small cantilevers, exceptional ease of use, and integrated thermal, acoustic and vibration control – all in a small footprint. Cypher AFMs routinely achieve higher resolution than other AFMs, as demonstrated by single point atomic defects in crystal lattices and imaging of the DNA double helix. The Cypher ES adds gas and liquid environmental control, temperature control, and enhanced chemical compatibility to the extraordinary performance of the Cypher S.
In addition to the best AFMs, Asylum Research also offers unmatched customer support that is free for the lifetime of the AFM and industry-leading warranties for the lowest cost of ownership of any AFM. Asylum has sales, applications and service staff in offices in the United States, Germany, United Kingdom, Japan, France, China and Taiwan and global distribution.
About Oxford Instruments plc
Oxford Instruments designs, supplies and supports high-technology tools and systems with a focus on research and industrial applications. Innovation has been the driving force behind Oxford Instruments' growth and success for over 50 years, and its strategy is to effect the successful commercialisation of these ideas by bringing them to market in a timely and customer-focused fashion.
The first technology business to be spun out from Oxford University, Oxford Instruments is now a global company with over 2300 staff worldwide and is listed on the FTSE250 index of the London Stock Exchange (OXIG). Its objective is to be the leading provider of new generation tools and systems for the research and industrial sectors with a focus on nanotechnology. Its key market sectors include nano-fabrication and nano-materials. The company’s strategy is to expand the business into the life sciences arena, where nanotechnology and biotechnology intersect.
This involves the combination of core technologies in areas such as low temperature, high magnetic field and ultra high vacuum environments; Nuclear Magnetic Resonance; x-ray, electron, laser and optical based metrology; atomic force microscopy; optical imaging; advanced growth, deposition and etching.
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