Software addresses patterning challenges at 45 and 32 nm.
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Press Release Summary:
Dimension45/32(TM) helps lithography and photomask synthesis teams select and optimize proper combination of exposure strategies and full-chip photomask layout synthesis to achieve optimal post-etch results on silicon with maximum process window and yield. Able to pattern critical routing layers at 45 nm using dry lithography, software also offers printability analysis, dynamic retargeting, model-based sub-resolution assist features, and DimensionPPC(TM) capabilities.
Original Press Release:
Invarium Unveils Dimension45/32(TM) Software to Address Patterning Challenges at 45 and 32 nm
New Patterning Synthesis Paradigms Deliver Superior Patterning Results; Impact the Choice of Dry Versus Immersion Lithography for Cost-Effective Patterning
SAN JOSE, Calif., Sept. 18 -- Invarium, a provider of advanced patterning synthesis solutions to the global semiconductor industry, today launched Dimension45/32(TM) to specifically address patterning challenges at the 45 and 32nm nodes. Dimension45/32 helps lithography and photomask synthesis teams to select and optimize the right combination of exposure strategies and full-chip photomask layout synthesis, together with -- if necessary -- layout retargeting, to achieve the best post-etch results on silicon, with the largest process window and best yield.
"Dimension45/32 addresses a number of specific lithography challenges that must be solved for robust manufacturability," said Dr. Apo Sezginer, chief technology officer at Invarium. "This new solution brings an added focus on solving problems, in addition to tool features and functions, that enable customers to quickly and cost-effectively pattern their designs and get to volume production. An important goal of Dimension45/32 is also the enablement of future patterning solutions at the 32nm node."
A unique capability of Dimension45/32 is the ability to pattern critical routing layers at 45nm using dry lithography instead of immersion. At the 45nm node, immersion lithography is generally considered necessary for front-end layers such as diffusion, gate poly and contact. But the approach to be taken for metal routing layers M2 to M6 or beyond is less obvious. Cost considerations as well as the availability of a sufficient number of immersion tools make an all-immersion solution at 45 nm questionable and expensive.
"At 45 nm, it is no longer sufficient to just supply RET/OPC tools with general capabilities to customers," said Dr. Franz Zach, vice president of applications for Invarium. "Dimension45/32, with the right combination of RET features, illumination and polarization techniques, can use a dry litho process to deliver a large process window and sufficient stability against process variations for all critical routing layers."
Included in Dimension45/32 are the full capabilities of DimensionPPC(TM), Invarium's current flagship solution, as well as a number of additional capabilities specifically geared to the 45 and 32 nm nodes. Integral to Dimension45/32 are capabilities for process setup optimization, printability analysis, dynamic retargeting, enhanced etch models, enhanced process window optimization, model-based sub-resolution assist features (SRAF) and yield- based optimization.
Dimension45/32 is currently being customer-qualified in North America, and a second customer qualification program will immediately commence in Asia. Invarium will showcase Dimension45/32 at the BACUS/SPIE Photomask Technology event in Monterey, California (September 18-22, 2006).
About Invarium
Invarium, Inc. provides advanced patterning synthesis solutions to the global semiconductor industry. The company's technology and solutions are geared to enable superior pattern accuracy on silicon for advanced IC designs, while accelerating time-to-volume production. The Invarium layout-to-mask solution represents a superior alternative to conventional RET/OPC tools and other layout correction techniques for process effects from mask through etch. Invarium is headquartered in San Jose, California, USA. www.invarium.com.
NOTE: DimensionPPC and Dimension45/32 are trademarks of Invarium.
