Invarium, Inc.
San Jose, CA 95110
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Software addresses patterning challenges at 45 and 32 nm.
Dimension45/32(TM) helps lithography and photomask synthesis teams select and optimize proper combination of exposure strategies and full-chip photomask layout synthesis to achieve optimal post-etch results on silicon with maximum process window and yield. Able to pattern critical routing layers at 45 nm using dry lithography, software also offers printability analysis, dynamic retargeting,...
Read More »Software patterns IC layouts at 65 nm or below.
Comprised of PPC model and mask layout synthesis engine, DimensionPPC(TM) patterning synthesis solution for ICs eliminates mask and silicon re-spins with correct-by-construction approach. PPC model captures key process variations without requiring multiple models for different conditions, and enables simulation of post-etch IC layout patterns. Mask layout is then optimally synthesized in single,...
Read More »Software addresses patterning challenges at 45 and 32 nm.
Dimension45/32(TM) helps lithography and photomask synthesis teams select and optimize proper combination of exposure strategies and full-chip photomask layout synthesis to achieve optimal post-etch results on silicon with maximum process window and yield. Able to pattern critical routing layers at 45 nm using dry lithography, software also offers printability analysis, dynamic retargeting,...
Read More »Software patterns IC layouts at 65 nm or below.
Comprised of PPC model and mask layout synthesis engine, DimensionPPC(TM) patterning synthesis solution for ICs eliminates mask and silicon re-spins with correct-by-construction approach. PPC model captures key process variations without requiring multiple models for different conditions, and enables simulation of post-etch IC layout patterns. Mask layout is then optimally synthesized in single,...
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