Photoresist employs optimized coating rheology.

Press Release Summary:




Offering 24-48 hr of stackability, Photoposit(TM) SN 68V Photoresist exhibits resistance to mechanical and handling damage. It also exhibits resolution capability of 25 micron lines and spaces, while minimal foaming characteristics can eliminate need for antifoam addition to developer. Able to be used in manual and automatic exposure equipment, product is resistant to acid-based etchants and optimized for use on vertical double-sided roller coaters.



Original Press Release:



Photoposit(TM) SN 68V Photoresist



A robust, high-yielding, fine-line, low-cost photoresist

Features and benefit
  • Excellent coating rheology
  • 24~48 hours of stackability
  • Unmatched resistance to mechanical and handling damage
  • Excellent chemical resistance to acid-based etchants
  • Resolution capability 25 micron lines and spaces
  • Low foaming. Little, or no need for addition of antifoam to the developer
  • Much less sludge generated during developing
  • Extremely wide processing window
  • Improved yield
  • Significant savings over dry film
  • Reduced labor and waste treatment costs

    SN68V Adhesion vs. Steps
    0
    1
    2
    3
    4
    5
    8 7.5 7 6.5 6 5.5 5 4.5 4 3.5 3 2.5 2 1.5 1
    21SST Resist Steps (non-beneanth artwork)
    Adhesion (mil)
    Developing Foaming Test
    0
    2
    4
    6
    8
    10
    12
    14
    16
    0 1 2 3 4 5 6 7 8 9
    Resist Loading (SSF/L)
    Foaing Height (cm)

    Photoposit(TM) SN 68V Photoresist has been developed to address industry demands for a robust, high-yielding, fineline, low-cost photoresist, that can be utilized in today's manual and automatic exposure equipment at optimum productivity levels. Photoposit(TM) SN 68V Photoresist has been optimized for use on vertical double-sided roller coaters and is supplied at a viscosity appropriate for roller coating.

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