Photoresists

Dry Film Negative Photoresist suits MEMS/CMOS applications.
Photoresists

Dry Film Negative Photoresist suits MEMS/CMOS applications.

Optimized for hot roll lamination and processing on MEMS and IC wafers, DF-3010 Dry Film Negative PhotoresistÂ- is available in thickness formats from 5–50 µm, ±5%. Film offers glass transition temperature of 158°C (By DMA Tan Delta) and moderate modulus of 3.5 GPa at 25°C. Hydrophobic in nature, product can withstand harsh environments including extreme...

Read More »
Engineered Materials Systems to Exhibit DF-1000 Series Negative Film Photoresists at 3D ASIP Conference
Photoresists

Engineered Materials Systems to Exhibit DF-1000 Series Negative Film Photoresists at 3D ASIP Conference

DELAWARE, OH - Engineered Materials Systems, Inc., a leading global supplier of negative photoresists for MEMS applications, will exhibit at the 3D Architectures for Semiconductor Integration and Packaging Conference and Exhibition, scheduled to take place December 15-17, 2015 at the Sofitel San Francisco bay Hotel in Redwood City, CA. Company representatives will showcase the DF-1000 Series...

Read More »
Engineered Materials Systems to Exhibit DF-3000 Series Negative Film Photoresists at SEMI MEMS 2015
Photoresists

Engineered Materials Systems to Exhibit DF-3000 Series Negative Film Photoresists at SEMI MEMS 2015

DELAWARE, OH - Engineered Materials Systems, Inc. (EMS), a leading global supplier of negative photoresists for MEMS applications, will showcase its DF-3000 Series Negative Film Photoresists during SEMI MEMS 2015, scheduled to take place September 17-18, 2015 at the AtaHotel in Milan, Italy. The DF-3000 series is available in various thickness formats from 5 to 50 Â-µm, ±5 percent. The...

Read More »
Negative Photoresist offers chemical and moisture resistance.
Photoresists

Negative Photoresist offers chemical and moisture resistance.

Optimized for hot roll lamination and processing on MEMS and IC wafers, DF-3050 Dry-film Negative Photoresist is available in thickness formats from 5–50 Â-µm, ±5%. Cured chemistry can withstand harsh environments including extreme moisture conditions and corrosive chemicals. With glass transition temperature of 158°C (By DMA Tan Delta) and moderate modulus of 3.5 GPa...

Read More »
Engineered Materials Systems, Inc. to Exhibit DF-3000 Series Negative Film Photoresists at ECTC 2015
Miscellaneous Film

Engineered Materials Systems, Inc. to Exhibit DF-3000 Series Negative Film Photoresists at ECTC 2015

DELAWARE, OHÂ- – Engineered Materials Systems (EMS), Inc., a leading global supplier of negative photoresists for MEMS applications, will exhibit in Booth #202 at ECTC 2015, scheduled to take place May 26-29, 2015 at the Sheraton Hotel and Marina in San Diego, CA. Company representatives will showcase its DF-3000 Series Negative Film Photoresists. The DF-3000 series is available in various...

Read More »
Dry-Film Negative Photoresist suits MEMS, wafer applications.
Photoresists

Dry-Film Negative Photoresist suits MEMS, wafer applications.

Optimized for hot roll lamination and processing on micro electro mechanical systems (MEMS) and IC wafers, DF-3020 comes in thickness formats from 5–50 Â-µm, ±5%. Cured chemistry can withstand harsh environments, including extreme moisture and corrosive chemicals; glass transition temperature is 158°C; and moderate modulus is 3.5 GPa at 25°C. Suited for MEMS and...

Read More »
Dry Film Negative Photoresist produces hydrophobic surfaces.
Photoresists

Dry Film Negative Photoresist produces hydrophobic surfaces.

Optimized for hot roll lamination and processing on micro-electromechanical systems (MEMS) and IC wafers, DF-4017 produces hydrophobic (>90° contact angle) film surfaces. Cured chemistry withstands harsh environments, including those subject to moisture and corrosive chemicals, while glass transition temperature of 145°C andÂ- moderate modulus of 4.5 GPa at 25°C lend to...

Read More »
Photoresist Processing System suits high volume manufacturing.
Coating Equipment

Photoresist Processing System suits high volume manufacturing.

Intended for high-volume logic and memory manufacturing, 300 mm EVG®150XT features 9 process modules that can operate simultaneously for multi-parallel wafer processing. System incorporates smart scheduling software for throughput-optimized handling sequences, along with pumps and dispense systems tailored for thick film applications. With in-line metrology module, variety of process...

Read More »
Dry Film Negative Photoresist targets MEMS applications.
Photoresists

Dry Film Negative Photoresist targets MEMS applications.

Optimized for hot roll lamination and processing on MEMS and IC wafers, DF-3020 Antimony-free Photoresist is available for sampling in 20 Â-µm thickness, ±1 µm and can be manufactured from 5–25 µm thick. Film features glass transition temperature of 165°C and moderate modulus of 4 GPa at 25°C. Hydrophobic in nature, cured chemistry can withstand...

Read More »
Dry Film Negative Photoresists withstand harsh environments.
Photoresists

Dry Film Negative Photoresists withstand harsh environments.

Optimized for hot roll lamination and processing on MEMS and IC wafers, DF-2000 SeriesÂ- is available in thickness formats from 5–50 µm ±5%. Films feature glass transition temperature of 145°C and moderate modulus of 4.5 GPa at 25°C. Hydrophobic in nature, cured chemistry can withstand harsh environments, including extreme moisture conditions and corrosive...

Read More »
How SpinSelect Can Save You Time and Money
Sponsored

How SpinSelect Can Save You Time and Money

Thanks to the unique SpinSelect™ Multi-Pocket selectable quick change tool holder, it's time to rethink the range, complexity and volume of parts that your lathe can produce. Our Spin-Select™ tool was created to increase productivity and consistency by decreasing downtime associated with lathe cutting tool and insert setups or changeovers. This product is a game-changer for the industry and we're pleased to show you why.

Read More »

All Topics

COVID-19 Response Suppliers COVID-19 Response:
Can Your Company Help Provide Critical Supplies?

We are using the power of our platform to aid in the mass shortage of critical supplies. If your company can help provide supplies, capabilities, or materials for products such as N-95 Masks and Tyvek SuitsPlease let us know.

COVID-19 Response Suppliers