Press Release Summary:
Photo Sciences uses multi-faceted micro lithography capabilities to pattern Indium Tin Oxide (ITO) coated substrates using direct-write laser, direct-write e-beam, optical reduction, and full field exposure lithography. Multi-level aligners expose and selectively etch other thin film metals and dielectrics, which can be layered with ITO patterns to create array of circuit and display configurations. Measurement and test equipment ensure that coatings meet thickness and resistance specifications.
Original Press Release:
Photo Sciences Develops Photomask Lithography and Micro Patterning Solutions Onto Substrates Coated With Indium Tin Oxide (ITO)
In September 2007 Photo Sciences successfully introduced a new process and procedure to use commercial photomask lithography and micro patterning solutions to image substrates coated with Indium Tin Oxide (ITO). New technology is demanding the etching of microscopic patterns on substrates coated with Indium Tin Oxide (ITO) because of its ability to combine electrical conductivity and optical transparency.
Photo Sciences uses its multi-faceted micro lithography capabilities to pattern Indium Tin Oxide (ITO) coated substrates using direct-write laser, direct-write e-beam, optical reduction and full field exposure lithography. The key to Photo Sciences' proprietary micro-patterning capabilities is its ability to deposit extremely uniform thin film coatings such as Indium Tin Oxide (ITO), which is critical in the lithographic process.
Photo Sciences uses state-of-the-art measurement and test equipment to insure that the thin film coatings meet thickness and resistance specifications in its micro patterning solutions. Photo Sciences uses multi-level aligners to expose and selectively etch other thin film metals and dielectrics, which can be layered with the Indium Tin Oxide (ITO) patterns to create a wide array of circuit and display configurations.
The patterned Indium Tin Oxide (ITO) substrates are mainly used to make transparent conductive coatings for liquid crystal displays, flat panel displays, plasma displays, touch panels, solar cells and EMI shieldings.
Photo Sciences uses its photomask lithography equipment, and thin film coating processes to etch micro patterns into Indium Tin Oxide (ITO) coatings on various substrate amterials. The transparency, temperature and conductive characteristics of Indium Tin Oxide (ITO) allows it to be useful to a whole range of nano-scale technologies and high temperature environments.
More information on Photo Sciences Inc and its range of commercial photomask and other micro patterning solutions can be found on www.photo-sciences.com
About Photo Sciences
Photo Sciences Specializes in a complete range of commercial photomasks, chemical milling and micro patterning solutions. Founded in 1972 Photo Sciences Inc services all major industry sectors such as Defense, Medical, Automotive, Electronics, and Telecommunications. Photomasks are used in wide range of semi conductor, custom, and nano scale applications such as near permanent projection graphics, glass motion control components, microscope/eye piece reticles, focusing tools, calibration instruments, deposition & evaporation masks, and light & fluid apertures.
The company is ISO 9001: 2000 certified, RoHS and WEEE compliant.
For more information, please contact Photo Sciences at (310) 634-1599 or
visit www.photo-sciences.com or email Roger Horstman, firstname.lastname@example.org