Photo Sciences, Inc.

Electronic Components & Devices

Photo Sciences Develops a Unique Approach to Manufacturing Custom Digital Gray Scales

Photo Sciences, Inc. of Torrance, California has developed a unique approach to manufacturing custom digital gray scales using sophisticated micro-lithography techniques typically used to produce photomasks for the semiconductor industry. The custom digital gray scales produced by Photo Sciences are on glass or quartz plates with microscopic images etched into a chrome coating on one surface of...

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Electronic Components & Devices

Commercial Photomasking uses photoimageable color polymer.

Multifaceted microlithography techniques pattern photoimageable color polymer-coated substrates using direct-write laser, direct-write e-beam, optical reduction, and full field exposure lithography. Photoimageable color polymers provide means of producing microscopic patterns in various standard colors as well as custom polymer colors. Line widths can be produced as small as 2 microns in color...

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Electronic Components & Devices

Photomask Services image substrates coated with ITO.

Photo Sciences uses multi-faceted micro lithography capabilities to pattern Indium Tin Oxide (ITO) coated substrates using direct-write laser, direct-write e-beam, optical reduction, and full field exposure lithography. Multi-level aligners expose and selectively etch other thin film metals and dielectrics, which can be layered with ITO patterns to create array of circuit and display...

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Printing & Duplicating Equipment

Photo Sciences: Commercial Photomask and Micro-Patterning Solutions

In September 2007 Photo Sciences successfully introduced a new process and procedure to enable commercial photomask lithography and micro patterning solutions to a range of nano scale technologies in addition to semi conductors. Traditionally this photomask techonology and chemical milling is commonly applied to semiconductors but with Photo Sciences commercial photomask lithography and micro...

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Milling Process etches micro holes through metal.

Using photo chemical milling process, Photo Sciences can etch holes as small as 2.5 Â-µm completely through thin sheets of metal. Etched features on metal parts have smooth, well-defined edges, making them suited for deposition masks or as apertures for optical applications. Chemical milling process specifically allows sub micron tolerances and complex patterns, which can be combined with in...

Read More »
Electronic Components & Devices

Photo Sciences Develops a Unique Approach to Manufacturing Custom Digital Gray Scales

Photo Sciences, Inc. of Torrance, California has developed a unique approach to manufacturing custom digital gray scales using sophisticated micro-lithography techniques typically used to produce photomasks for the semiconductor industry. The custom digital gray scales produced by Photo Sciences are on glass or quartz plates with microscopic images etched into a chrome coating on one surface of...

Read More »
Electronic Components & Devices

Commercial Photomasking uses photoimageable color polymer.

Multifaceted microlithography techniques pattern photoimageable color polymer-coated substrates using direct-write laser, direct-write e-beam, optical reduction, and full field exposure lithography. Photoimageable color polymers provide means of producing microscopic patterns in various standard colors as well as custom polymer colors. Line widths can be produced as small as 2 microns in color...

Read More »
Electronic Components & Devices

Photomask Services image substrates coated with ITO.

Photo Sciences uses multi-faceted micro lithography capabilities to pattern Indium Tin Oxide (ITO) coated substrates using direct-write laser, direct-write e-beam, optical reduction, and full field exposure lithography. Multi-level aligners expose and selectively etch other thin film metals and dielectrics, which can be layered with ITO patterns to create array of circuit and display...

Read More »
Printing & Duplicating Equipment

Photo Sciences: Commercial Photomask and Micro-Patterning Solutions

In September 2007 Photo Sciences successfully introduced a new process and procedure to enable commercial photomask lithography and micro patterning solutions to a range of nano scale technologies in addition to semi conductors. Traditionally this photomask techonology and chemical milling is commonly applied to semiconductors but with Photo Sciences commercial photomask lithography and micro...

Read More »

Milling Process etches micro holes through metal.

Using photo chemical milling process, Photo Sciences can etch holes as small as 2.5 Â-µm completely through thin sheets of metal. Etched features on metal parts have smooth, well-defined edges, making them suited for deposition masks or as apertures for optical applications. Chemical milling process specifically allows sub micron tolerances and complex patterns, which can be combined with in...

Read More »
Company News

Photo Sciences Introduces new Fast Trak PLUS Photomask Service

In February 2007 Photo Sciences successfully introduced Fast Trak PLUS Photomask Service. This photomask service is a further improvement on the existing Fast Trak photomask service which utilizes machine ready data. The key difference in the new FAST TRACK PLUS" is that it allows customers to take advantage of the low fixed price for the laser written master photomask and the 48 hour delivery of...

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