Optical Metrology System uses water immersion technique.
Press Release Summary:
LWM500 WI optical mask metrology system incorporates immersion microscope objectives for optical critical dimension measurements on photomasks in semiconductor production. It supports critical dimension metrology requirements for R&D and production of 65 nm node reticles. Product combines water immersion with 248 nm DUV illumination to enhance optical resolution. Drop of water, applied between photomask substrate and objective, acts as immersion medium.
Original Press Release:
Leica Microsystems' New LWM500 WI Has Successfully Passed Its First Customer Acceptance Test
WETZLAR, GERMANY. Leica Microsystems Semiconductor's new optical mask critical dimension (CD) metrology system recently successfully passed its first customer acceptance test at a customer beta-site in Japan. The Leica LWM500 WI is the first tool of Leica Microsystems' fourth generation of extremely successful optical mask CD measurement systems. More than 60 previous generations systems have been installed worldwide at captive and merchant mask shops.
The new LWM500 WI is designed to support the CD metrology requirements for both R&D and production of 65nm node reticles. Leica Microsystems combined water immersion technology with 248nm DUV illumination to achieve revolutionary optical resolution. The new objective results from consistent further development of the Leica DUV AT technology that was awarded the Innovation Award of German Industry in 2002. A small drop of water is applied between the photomask substrate and the objective, acting as an immersion medium. The refractive index of water is higher than that of air, and a higher refractive ndex increases the resolution. The new objective offers 25 per cent more resolution performance than the previously available objectives.
Water immersion technology is well accepted in biological applications due to the high optical resolution. Semiconductor manufacturers are only just beginning to realize the potential for water immersion in the use of 65nm node optical lithography. Leica Microsystems is the first optics producer to develop and successfully manufacture immersion microscope objectives for optical critical dimension measurements on photomasks in semiconductor production. Leica Microsystems' long term cooperation partner Muetec (Munich/Germany) performed the integration of the objective into the LWM500 WI metrology system. Excellent hardware and software solutions insure that the outstanding optical resolution performance leads to outstanding measurement repeatability performance significantly better than 1nm on photomasks.
Leica Microsystems is a leading global designer and producer of innovative high-tech precision optics systems for the analysis of microstructures. It is one of the market leaders in each of the fields Microscopy, Imaging Systems, Specimen Preparation, Medical Equipment and Semiconductor Equipment. The company manufactures a broad range of products for numerous applications, which require either microscopic visual presentation, measurement, analysis or electron-beam lithography. The company offers system solutions in the areas of Life Science including biotechnology and medicine, as well as the science of raw materials, industrial quality assurance and the semiconductor industry. The company is represented in over 100 countries with 10 manufacturing facilities in 7 countries, sales and service organizations in 19 countries and an international network of dealers. With its workforce of about 3600 employees it makes a turnover of 521m euros. The international management is headquartered in Wetzlar, Germany.
Dr. Kirstin Henze
Tel.: +49(0)6441/29-2550
Fax: +49(0)6441/29-2527
kirstin.henze@leica-microsystems.com
Leica Microsystems AG
Ernst-Leitz-Straße 17-37
D - 35578 Wetzlar
www.leica-microsystems.com
