Anti-Reflective Coating targets KrF photolithographers.

Press Release Summary:

Designed to meet tightening specifications of 22 nm node and beyond, ARC® DS-K101P developer-soluble bottom anti-reflective coating has less than 1 ppb ions, while maintaining broad resist compatibility and tunability. Tight n and k optical constants provide consistent performance, while developer solubility optimizes throughput by eliminating etch step.

Original Press Release:

Brewer Science Introduces Premium DBARC Material that Improves Throughput and Reduces Cost

Brewer Science, Inc., a leading supplier of advanced lithography materials, has released ARC® DS-K101P developer-soluble bottom anti-reflective coating (DBARC). This
DBARC product has been formulated to meet the needs of the KrF photolithographer and
augments processes where the resist budget is limited.

Building on a strong history of creating DBARCs, Brewer Science has developed a premium
version of the successful Brewer Science® ARC® DS-K101 coating. ARC® DS-K101P KrF
DBARC is designed to meet the tightening specifications of the 22-nm node and beyond. ARC® DS-K101P material has less than 1 ppb ions, while still maintaining the broad resist compatibly and tunability of the industry-proven ARC® DS-K101 coating. This new premium product will enable existing implant processes to transfer to future nodes.

"Brewer Science's continuous improvement process supports customers with new leading-edge lithography products," says Jim Lamb, Managing Director of Product Management at Brewer Science. "ARC® DS-K101P DBARC was created to give customers a valued solution for < 150-nm CD processes for implant, and a viable cost reduction for BEOL layers."
The tight n and k optical constants of Brewer Science® ARC® DS-K101P coating provide
consistent performance, while developer solubility can improve throughput by eliminating an etch step, which reduces the cost of ownership. Call Brewer Science today to learn more.

About Brewer Science

Brewer Science delivers innovative material, process, and equipment solutions for various applications including nanotechnology, lithography, advanced packaging, MEMS,
optoelectronics, and compound semiconductors. As the inventor of ARC® anti-reflective coating products for the microlithography world, Brewer Science continues to expand its scope with CNTRENE® microelectronics-grade carbon nanotube solutions, ProTEK® temporary etch protective coatings, WaferBOND® temporary bonding materials, OptiNDEX(TM) high refractive index coatings, and Cee® processing equipment. Please visit for further information.

Contact information: Carlton Washburn, Product Manager, Brewer Science, tel: +1.573.364.0300, email:

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