MPE - Modern Process Equipment, Inc.

Roller Mill is designed for chemical applications.
Laboratory and Research Supplies and Equipment

Roller Mill is designed for chemical applications.

Gran-U-Lizer(TM) IMD 1052 virtually eliminates unwanted fines and provides uniform particle size. Continuous roller-style grinding method can eliminate downstream classification systems. Materials of construction vary from carbon steel to stainless steel to accommodate corrosion resistance and various levels of contamination requirements. Common applications include super absorbent chemicals,...

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Particle Reducer is suited for dried food applications.
Test & Measurement

Particle Reducer is suited for dried food applications.

Bringing control to particle size reduction, IMD 888 Gran-U-Lizer(TM) employs design that eliminates creation of fines, provides uniform particle size, and offers flexibility on final grind targets. It delivers narrow particle size distribution and uses continuous roller-style grinding method that eliminates downstream classification systems. Materials of construction vary from carbon to...

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Roller Mill offers precise particle size reduction.
Laboratory and Research Supplies and Equipment

Roller Mill offers precise particle size reduction.

Multiple-stage, IMD 69.5 Gran-U-Lizer(TM) can integrate up to 5 grinder stages, resulting in high degree of single pass size reduction and narrow particle size distribution. Heavy construction provides minimal vibration and maintained tolerances under extreme conditions. Available with PLC control, integrated touch screen, controlled grinding atmospheres, and GMP qualification, system is suited...

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Grinder uses GMP roller grinding technology.
Machinery & Machining Tools

Grinder uses GMP roller grinding technology.

Model IMD69 GMP Gran-U-Lizer(TM), pharmaceutical grade roller style grinder, incorporates three-stage progressive roller reduction design. It offers features such as full wash-down capability, controlled grinding environment (N2, Ar), water-cooling, and PLC controls. It is suited for GMP applications requiring narrow particle distribution with fines reduction of up to 75%.

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