Turbomolecular Vacuum Pump prevents powder deposition.
February 24, 2014 -
Pairing rotor with iXA Series on-board controller, Model STP-iXA4506 maximizes allowable gas throughput for high-flow processes. Absence of mechanical bearings virtually eliminates periodic maintenance. Operating at speeds up to 4,300 l/s N2 with throughput up to 4,330 sccm N2, pump is suitable for semiconductor etch, LCD etch, glass coating, solar PVD, and coating PVD applications. When needed, thermal management system can be added to minimize accumulation of deposits and particulates.
|Original Press Release |
Edwards Vacuum Technology
301 Ballardvale St.
Wilmington, MA, 01887
Edwards New Large Capacity Turbomolecular Vacuum Pump Maximises Performance
State-of-the-art technology improves gas flow capability and high temperature management to prevent powder deposition
CRAWLEY, WEST SUSSEX, UK. — Edwards Limited, a leading manufacturer of sophisticated vacuum products and abatement systems and a global provider of related value-added services, introduced today its STP-iXA4506 large-capacity turbomolecular pump (TMP), designed to deliver significant savings for cost-sensitive manufacturers of semiconductors, flat panel displays, LEDs and solar panels.
“The new STP-iXA4506 turbo pump is the all-in-one solution with improved pumping performance,” states Shinichi Yoshino, TMP Product Marketing Manager, Edwards. “It pairs Edwards’ latest rotor design with the well-established, highly reliable, on-board controller of the iXA series, to maximise the allowable gas throughput and, hence, minimise the number of pumps required for high-flow processes, particularly in solar and flat panel applications. The fully-integrated controller eliminates the need and cost of cables and a separate controller rack, resulting in a compact package that is fast and easy to install in a variety of applications. And, like all of our magnetically-levitated turbo pumps, the absence of mechanical bearings practically eliminates the cost of periodic maintenance.”
The pump’s high speed (4300 l/s N2) and throughput (up to 4300 sccm N2), combined with its ability to efficiently pump both light and heavy gases, make the STP-iXA4506 ideal for a wide range of large-volume, high-flow applications, including semiconductor etch, LCD etch, glass coating, solar PVD and coating PVD. Its tightly-integrated design includes a completely sealed electronic module for robust, reliable operation in the most demanding factory environments. When needed, a thermal management system can be added to reduce the accumulation of deposits and particulates from process byproducts.
For further information, please visit www.edwardsvacuum.com.
Edwards is a leading developer and manufacturer of sophisticated vacuum products, abatement systems and related value-added services. These are integral to manufacturing processes for semiconductors, flat panel displays, LEDs and solar cells; are used within an increasingly diverse range of industrial processes including power, glass and other coating applications, steel and other metallurgy, pharmaceutical and chemical; and for both scientific instruments and a wide range of R&D applications.
Edwards has over 3,200 full-time employees and 500 temporary workers operating in approximately 20 countries worldwide engaged in the design, manufacture and support of high technology vacuum and exhaust management equipment.
Further information about Edwards can be found at www.edwardsvacuum.com.