Edwards Vacuum Technology
Three Highwood Drive
Tewksbury, MA 01876
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Edward Offers iXH Mk2 Series Dry Pump with Significant Improvements in Power Efficiency
Suitable for semiconductor, display, LED and solar PV manufacturing processes. Reduces the environmental impact of harsh processes in semiconductor manufacturing. Designed to overcome the process challenges in high-k, low-k, SACVD, LPCVD, ALD, TCO, GaN and EPI.
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Edward Offers iXH Mk2 Series Dry Pump with Significant Improvements in Power Efficiency
Suitable for semiconductor, display, LED and solar PV manufacturing processes. Reduces the environmental impact of harsh processes in semiconductor manufacturing. Designed to overcome the process challenges in high-k, low-k, SACVD, LPCVD, ALD, TCO, GaN and EPI.
Read More »
Turbomolecular Vacuum Pump prevents powder deposition.
Pairing rotor with iXA Series on-board controller, Model STP-iXA4506 maximizes allowable gas throughput for high-flow processes. Absence of mechanical bearings virtually eliminates periodic maintenance. Operating at speeds up to 4,300 l/s N2 with throughput up to 4,330 sccm N2, pump is suitable for semiconductor etch, LCD etch, glass coating, solar PVD, and coating PVD applications. When needed,...
Read More »
Turbomolecular Vacuum Pump prevents powder deposition.
Pairing rotor with iXA Series on-board controller, Model STP-iXA4506 maximizes allowable gas throughput for high-flow processes. Absence of mechanical bearings virtually eliminates periodic maintenance. Operating at speeds up to 4,300 l/s N2 with throughput up to 4,330 sccm N2, pump is suitable for semiconductor etch, LCD etch, glass coating, solar PVD, and coating PVD applications. When needed,...
Read More »
Dry Screw Vacuum Pumps handle large gas volumes.
With ultimate vacuum typically down to 3.8 x 10-4 Torr without purge, Models GXS450 and GXS750 deliver peak pumping speeds up to 435 cfm. When combined with booster pump, units offer speeds up to 1,978 cfm. Pump mechanism can be cleaned using high flow purge and solvent flush accessory, which removes need to partially strip pump. Fitted with controller as standard, pumps are suited for steel...
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Dry Screw Vacuum Pumps handle large gas volumes.
With ultimate vacuum typically down to 3.8 x 10-4 Torr without purge, Models GXS450 and GXS750 deliver peak pumping speeds up to 435 cfm. When combined with booster pump, units offer speeds up to 1,978 cfm. Pump mechanism can be cleaned using high flow purge and solvent flush accessory, which removes need to partially strip pump. Fitted with controller as standard, pumps are suited for steel...
Read More »Dry Vacuum Pumps feature tapered screw technology.
Suited for liquid and solids handling in chemical, petrochemical, and pharmaceutical processes, CXS Pumps offer vacuum down to 10-3 mbar with no contamination of process stream or cooling water and no effluent generation. Tapered screw technology gives smooth, gradual compression along length of rotor for optimized pumping at all inlet pressures. Independently certified for hazardous...
Read More »Dry Vacuum Pumps feature tapered screw technology.
Suited for liquid and solids handling in chemical, petrochemical, and pharmaceutical processes, CXS Pumps offer vacuum down to 10-3 mbar with no contamination of process stream or cooling water and no effluent generation. Tapered screw technology gives smooth, gradual compression along length of rotor for optimized pumping at all inlet pressures. Independently certified for hazardous...
Read More »
Dry Screw Vacuum Pumps are virtually maintenance-free.
Providing vacuum down to 1 x 10-3 mbar, GXS Series features service life up to 5 years, even in harsh applications. Pump mechanism can be cleaned using high flow purge and solvent flush accessory, eliminating need to partially strip pump. Shafts are supported at both ends, resulting in optimized dust handling, minimized vibration, and noise levels below 64 dB(A). Applications include lamination,...
Read More »
Dry Screw Vacuum Pumps are virtually maintenance-free.
Providing vacuum down to 1 x 10-3 mbar, GXS Series features service life up to 5 years, even in harsh applications. Pump mechanism can be cleaned using high flow purge and solvent flush accessory, eliminating need to partially strip pump. Shafts are supported at both ends, resulting in optimized dust handling, minimized vibration, and noise levels below 64 dB(A). Applications include lamination,...
Read More »Edwards Responds to United Nations' New Greenhouse Gas Guidelines
More stringent IPCC guidelines include accounting for CF4 by-product formation and emissions. Burgess Hill, West Sussex, U.K. (29 May 2019) – The Intergovernmental Panel on Climate Change (IPCC), the United Nations’ body for assessing the science related to climate change, has just released the latest refinement to its 2006 Guidelines. As part of an effort to tackle climate change, the...
Read More »Edwards Responds to United Nationsâ™ New Greenhouse Gas Guidelines
More stringent IPCC guidelines include accounting for CF4 by-product formation and emissions. Burgess Hill, West Sussex, U.K. (29 May 2019) – The Intergovernmental Panel on Climate Change (IPCC), the United Nations’ body for assessing the science related to climate change, has just released the latest refinement to its 2006 Guidelines. As part of an effort to tackle climate change, the...
Read More »
Edward Offers iXH Mk2 Series Dry Pump with Significant Improvements in Power Efficiency
Suitable for semiconductor, display, LED and solar PV manufacturing processes. Reduces the environmental impact of harsh processes in semiconductor manufacturing. Designed to overcome the process challenges in high-k, low-k, SACVD, LPCVD, ALD, TCO, GaN and EPI.
Read More »
Edward Offers iXH Mk2 Series Dry Pump with Significant Improvements in Power Efficiency
Suitable for semiconductor, display, LED and solar PV manufacturing processes. Reduces the environmental impact of harsh processes in semiconductor manufacturing. Designed to overcome the process challenges in high-k, low-k, SACVD, LPCVD, ALD, TCO, GaN and EPI.
Read More »Latest Abatement System Installation Marks a Milestone of Success for Edwards
Edwards now has 10,000 inward fired combustion abatement systems installed in semiconductor fabs worldwide; its abatement solutions have prevented over 14 million tons of carbon dioxide equivalent emissions from being released into the atmosphere in 2017. SAN FRANCISCO – SEMICON West (11 July 2018) – Edwards Vacuum, a leading manufacturer of vacuum and abatement solutions, announces a...
Read More »Latest Abatement System Installation Marks a Milestone of Success for Edwards
Edwards now has 10,000 inward fired combustion abatement systems installed in semiconductor fabs worldwide; its abatement solutions have prevented over 14 million tons of carbon dioxide equivalent emissions from being released into the atmosphere in 2017. SAN FRANCISCO – SEMICON West (11 July 2018) – Edwards Vacuum, a leading manufacturer of vacuum and abatement solutions, announces a...
Read More »Edwards Vacuum Breaks Ground on New High-Technology Innovation Center in Hillsboro
New center is strategically located close to key semiconductor customer sites for enhanced technology collaboration & development HILLSBORO, Ore. (16 April 2018) – Edwards Vacuum, a leading manufacturer of vacuum and abatement solutions, following completion of the purchase of an eight-acre site located on NE Century Boulevard in Hillsboro, Ore., has begun the process of construction for a new...
Read More »Edwards Vacuum Breaks Ground on New High-Technology Innovation Center in Hillsboro
New center is strategically located close to key semiconductor customer sites for enhanced technology collaboration & development HILLSBORO, Ore. (16 April 2018) – Edwards Vacuum, a leading manufacturer of vacuum and abatement solutions, following completion of the purchase of an eight-acre site located on NE Century Boulevard in Hillsboro, Ore., has begun the process of construction for a new...
Read More »
Turbomolecular Vacuum Pump prevents powder deposition.
Pairing rotor with iXA Series on-board controller, Model STP-iXA4506 maximizes allowable gas throughput for high-flow processes. Absence of mechanical bearings virtually eliminates periodic maintenance. Operating at speeds up to 4,300 l/s N2 with throughput up to 4,330 sccm N2, pump is suitable for semiconductor etch, LCD etch, glass coating, solar PVD, and coating PVD applications. When needed,...
Read More »
Turbomolecular Vacuum Pump prevents powder deposition.
Pairing rotor with iXA Series on-board controller, Model STP-iXA4506 maximizes allowable gas throughput for high-flow processes. Absence of mechanical bearings virtually eliminates periodic maintenance. Operating at speeds up to 4,300 l/s N2 with throughput up to 4,330 sccm N2, pump is suitable for semiconductor etch, LCD etch, glass coating, solar PVD, and coating PVD applications. When needed,...
Read More »