Plasma Etching System meets needs of diverse tasks.April 7, 2010 -
Fully self-contained, RIE-1701 bench-top anisotropic reactive ion etch (RIE) system has automated chamber opening system and interlocked chamber enclosure that provides additional safety for those using corrosive gasses. Only vacuum pump package is external to system. Suitable plasma etching and cleaning applications include SiO2, Si3N4, and polyimide passivation removal; interlayer dielectric removal; as well as single-wafer cleaning, descum, stripping, and etching.
Nordson MARCH Announces New RIE-1701 Anisotropic Reactive Ion Etch Plasma System
(Archive News Story - Products mentioned in this Archive News Story may or may not be available from the manufacturer.)
28601 Clemens Rd.
Westlake, OH, 44145
Press release date: January 31, 2010
Concord, California - Nordson MARCH, the global leader in advanced plasma cleaning and etching systems, announced today the release of the RIE-1701 Anisotropic Reactive Ion Etch Plasma System. The new system will replace Nordson MARCH's existing CS-1701 plasma system, which is currently the world's leading bench-top anisotropic reactive ion etch plasma system.
The RIE-1701 plasma system is a fully self-contained, bench-top anisotropic reactive ion etch (RIE) system, with only the vacuum pump package external to the system. Innovative design features include an automated chamber opening system, and an interlocked chamber enclosure that provides an added level of safety for customers who wish to use corrosive gasses.
The RIE-1701 plasma system is designed for advanced plasma etching and cleaning applications, including silicon oxide, silicon nitride, and polyimide passivation removal; interlayer dielectric removal for failure analysis, etching of silicon, III-V, and II-VI materials for MEMS, LED, and IC device manufacturing; single-wafer cleaning, descum, stripping, and etching; and removal of epoxy and IC mold materials.
"The RIE-1701 plasma system is a thoroughly modern update of the classic bench-type RIE plasma system, leveraging the best-in-class plasma technology available only from Nordson MARCH," said James Getty, Director of Applications and Business Development at Nordson MARCH. "The RIE-1701 plasma system was designed to replace our class-leading CS-1701 system, which is being discontinued upon the release of the RIE-1701 plasma system."
The RIE-1701 plasma system is on sale now, and available for customers world-wide through Nordson MARCH's extensive sales and service network.
For more information, contact Nordson MARCH (www.nordsonmarch.com).
About Nordson MARCH: Nordson MARCH is the global leader in plasma processing technology for the semiconductor, printed circuit board (PCB), microelectronics, and medical & life science device manufacturing industries. Nordson MARCH has offices and applications laboratories worldwide, including California, Florida, Europe, Singapore, China, Japan, Korea and Taiwan. With over 20 years of continuous innovation, Nordson MARCH designs and manufactures a complete line of award-winning and patented plasma processing systems. An expert staff of scientists and engineers is available to assist in the development of plasma processes that improve both product reliability and increase production yields. Visit the Nordson MARCH web site for more details: www.nordsonmarch.com.
Nordson MARCH is a subsidiary of Nordson Corporation (NASDAQ: NDSN), the world's leading producer of precision dispensing and coating equipment.
For further information contact: Nordson MARCH - World Headquarters 2470-A Bates Avenue Concord, California 94520 U.S.A. TEL: 1.925.827.1240 email@example.com www.nordsonmarch.com