
New MK-II Plasma Etching System Features Single 24 by 18 Horizontal Shelf
Capable of desmear and etch back as well as ideal for low volume and startup PCB manufacturers. Horizontal shelf allows flexible circuits to be placed flat on the shelf, eliminating shorts between the electrode and the chamber. Low cost version system produces consistent, uniform and reliable etch rates.
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New MK-II Vertical Designed to Hang Boards Vertically Between Electrodes
Available in 6, 12 and 24 board configurations. Can be used as an isotropic plasma etcher or as plasma cleaner for surface activation and organics removal. Used to prep Teflon surfaces for plating and to remove carbon after laser drilling.
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Plasma Etch, Inc. Sees Strong Sales of Gasless Mark II Plasma System
Carson City, NV – Plasma Etch Inc, a leader in plasma treatment, has seen strong sales increases since introducing gasless etching technology on the company’s flagship system. The patented gasless technology allows the Mark II to offer unmatched speed and uniformity for desmear and etch back cycles without the added expense and environmental impact of CF4 gas. The system uses only electricity...
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Plasma Etch, Inc. Announces Robust Sales of Mark II Plasma System with Gasless Technology
Carson City, NV – Plasma Etch Inc, a leader in plasma treatment, introduced the company’s patented gasless etching technology on the Mark II line of plasma etchers about a year ago. The patented gasless technology, originally developed for larger systems, has been condensed and allows the Mark II to offer unmatched speed and uniformity. Since the release of the gasless technology, sales of...
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Heated Deck Panels
Heated Deck Panels: The playbook to how these snow-free walkways work for bridges, sidewalks, and platforms
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CobaltONE Plate Etching Machine uses fiber laser technology.
Equipped with Inkcups’ patented Cobalt Laser Plates, CobaltONE Laser Plate Etching Machine features small footprint that can be easily integrated into any work space. Enabling user to print quickly and change-over artwork with a single click, machine uses direct computer to plate etching. This unit eliminates the use of multiple components.
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Plasma Confinement Ring accelerates etch rate.
Available with SPHERE™ plasma systems, Plasma Confinement Ring targets wafer processing and wafer fan-out applications. Made with insulated, non-conductive material, ring concentrates and focuses plasma directly over wafer to speed etching process, provide uniform plasma coverage, and to isolate plasma on wafer itself. Using confinement ring, there is a free conduction path between upper and...
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Plasma Etch, Inc. Releases New Technical Details About the World's First Plasma Etching System Requiring No CF4 Gas
Carson City, NV – Plasma Etch Inc, a leader in plasma innovation, has release new details about the workings of the Magna plasma etching system.- The Magna series utilizes the newest technologies available, eliminating the need for CF4 gas, a harmful contributor to ozone layer depletion.- CF4 gas is presently used by PCB manufacturers using plasma etching systems across the globe. Oxygen is...
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Plasma Treatment Systems serve semiconductor applications.
Targeting wafer-level and 3D packaging applications, TrophoSPHERE™ and StratoSPHERE™ support automated handling and processing of round or square wafers and perform descum, ashing, dielectric etch, wafer bumping, organic contamination removal, and wafer destress. Troposphere is designed for high-throughput processing of semiconductor wafers and other flat substrates in sizes from 3–8 in....
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Plasma Etch, Inc. Announces Live Plasma Ashing Demonstration at Semicon West 2015
Carson City, NV – Plasma Etch Inc, a leader in plasma innovation, will be providing live demonstrations of the company's popular PE-50 Plasma Asher to attendees at the Semicon West 2015 trade show.- The show runs July 14 – 16 at the Moscone Center in San Francisco. This is a great opportunity for Semiconductor manufacturers to see and touch a working PE-50 Plasma Asher.- Company...
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Nordson MARCH Demonstrates FlexTRAK-CD Plasma System for Lead Frame and Strip-type Electronic Components at NEPCON Japan in East Hall 2, Booths 12-20
See Nordson MARCH at NEPCON Japan East Hall 2, Booths 12-20 Concord, California, USA- — Nordson MARCH, a Nordson company (NASDAQ: NDSN), a global leader in plasma processing technology, announces that it will be demonstrating its FlexTRAK™-CD Plasma System for high throughput processing of lead frame strips and other strip-type electronic components, up to 5 strips per plasma cycle, at...
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More performance and functionality for Sinumerik 828D CNC
Siemens new SINUMERIK 828D ADVANCED, SINUMERIK 828D and SINUMERIK 828D BASIC sets the standard for productivity enhancements of turning and milling operations on standardized machines and simplify the automation of grinding machines. See our video to learn all about it.
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