Etchers

Plasma Etch, Inc. Sees Strong Sales of Gasless Mark II Plasma System
Etchers

Plasma Etch, Inc. Sees Strong Sales of Gasless Mark II Plasma System

Carson City, NV – Plasma Etch Inc, a leader in plasma treatment, has seen strong sales increases since introducing gasless etching technology on the company’s flagship system. The patented gasless technology allows the Mark II to offer unmatched speed and uniformity for desmear and etch back cycles without the added expense and environmental impact of CF4 gas. The system uses only electricity...

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Plasma Etch, Inc. Announces Robust Sales of Mark II Plasma System with Gasless Technology
Etchers

Plasma Etch, Inc. Announces Robust Sales of Mark II Plasma System with Gasless Technology

Carson City, NV – Plasma Etch Inc, a leader in plasma treatment, introduced the company’s patented gasless etching technology on the Mark II line of plasma etchers about a year ago. The patented gasless technology, originally developed for larger systems, has been condensed and allows the Mark II to offer unmatched speed and uniformity. Since the release of the gasless technology, sales of...

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CobaltONE Plate Etching Machine uses fiber laser technology.
Etchers

CobaltONE Plate Etching Machine uses fiber laser technology.

Equipped with Inkcups’ patented Cobalt Laser Plates, CobaltONE Laser Plate Etching Machine features small footprint that can be easily integrated into any work space. Enabling user to print quickly and change-over artwork with a single click, machine uses direct computer to plate etching. This unit eliminates the use of multiple components.

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Plasma Confinement Ring accelerates etch rate.
Miscellaneous Rings

Plasma Confinement Ring accelerates etch rate.

Available with SPHERE™ plasma systems, Plasma Confinement Ring targets wafer processing and wafer fan-out applications. Made with insulated, non-conductive material, ring concentrates and focuses plasma directly over wafer to speed etching process, provide uniform plasma coverage, and to isolate plasma on wafer itself. Using confinement ring, there is a free conduction path between upper and...

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CMAA Crane Buyer's Guide
Sponsored

CMAA Crane Buyer's Guide

CMAA has organized this Buyer's Guide to promote standardization and to assist prospective buyer's of electric overhead traveling cranes in selection of equipment most suitable for their applications.

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Plasma Etch, Inc. Releases New Technical Details About the World's First Plasma Etching System Requiring No CF4 Gas
Etching Services

Plasma Etch, Inc. Releases New Technical Details About the World's First Plasma Etching System Requiring No CF4 Gas

Carson City, NV – Plasma Etch Inc, a leader in plasma innovation, has release new details about the workings of the Magna plasma etching system.Â- The Magna series utilizes the newest technologies available, eliminating the need for CF4 gas, a harmful contributor to ozone layer depletion.  CF4 gas is presently used by PCB manufacturers using plasma etching systems across the globe....

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Plasma Treatment Systems serve semiconductor applications.
Etchers

Plasma Treatment Systems serve semiconductor applications.

Targeting wafer-level and 3D packaging applications, TrophoSPHERE™ and StratoSPHERE™ support automated handling and processing of round or square wafers and perform descum, ashing, dielectric etch, wafer bumping, organic contamination removal, and wafer destress. Troposphere is designed for high-throughput processing of semiconductor wafers and other flat substrates in sizes from 3–8 in....

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Plasma Etch, Inc. Announces Live Plasma Ashing Demonstration at Semicon West 2015
Miscellaneous Cleaning Equipment

Plasma Etch, Inc. Announces Live Plasma Ashing Demonstration at Semicon West 2015

Carson City, NV – Plasma Etch Inc, a leader in plasma innovation, will be providing live demonstrations of the company's popular PE-50 Plasma Asher to attendees at the Semicon West 2015 trade show.Â-  The show runs July 14 – 16 at the Moscone Center in San Francisco. This is a great opportunity for Semiconductor manufacturers to see and touch a working PE-50 Plasma Asher. ...

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Nordson MARCH Demonstrates FlexTRAK-CD Plasma System for Lead Frame and Strip-type Electronic Components at NEPCON Japan in East Hall 2, Booths 12-20
Miscellaneous Cleaning Equipment

Nordson MARCH Demonstrates FlexTRAK-CD Plasma System for Lead Frame and Strip-type Electronic Components at NEPCON Japan in East Hall 2, Booths 12-20

See Nordson MARCH at NEPCON Japan East Hall 2, Booths 12-20 Concord, California, USAÂ- — Nordson MARCH, a Nordson company (NASDAQ: NDSN), a global leader in plasma processing technology, announces that it will be demonstrating its FlexTRAK™-CD Plasma System for high throughput processing of lead frame strips and other strip-type electronic components, up to 5 strips per plasma cycle, at...

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Metal Etch Systems produce uniform results.
Etchers

Metal Etch Systems produce uniform results.

Designed for compound semiconductor manufacturing, Critical Etch Systems for Au, Ag, Cu and TiW deliver optimized within-wafer, wafer-to-wafer, and batch-to-batch etch uniformity. Wet processing systems also enable consistent etching even within dense patterned areas. Field proven on 1–5 Â-µm features, batch immersion systems are configurable for single or combination metal etch steps over...

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Semiconductor Processing Equipment

Semiconductor Processing Tool minimizes plama-induced damage.

Targeted for 2xnm and below etch applications, Primo iDEA™ integrates 4 dielectric etch stations and 2 photoresist strip chambers onto same platform. Integrative approach enables optimization of each process stepÂ- and minimizes risk of plasma-induced damage. With dedicated dielectric etch and downstream ashing capabilities, offering is optimal for FEOL and BEOL applications...

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