ThomasNet Home   |   Promote Your Business
Home  |   My ThomasNet News®  |   Industry Market Trends  |   Submit Release  |   Advertise  |   About Us Feb 14, 2012  

Metrology System offers copper process control solution.

Print | 
Email |  Comment   Share  
Metrology System offers copper process control solution.
Metrology System offers copper process control solution.

Click Here to Enlarge Picture

May 27, 2009 - Measuring 60-80 product wafers/hr, MetaPULSE®-G thin film measurement tool is optimized specifically for copper damascene processes at 45 through 22 nm technology nodes and copper via fill in 3D IC applications. Tool uses green wavelength laser for measurement repeatability better than 0.3%. System's 10 x 10 µm spot size is small enough to measure wafers in 30 x 30 µm or smaller test sites.

(Archive News Story - Products mentioned in this Archive News Story may or may not be available from the manufacturer.)
Original Press release

Rudolph Technologies, Inc.
1 Rudolph Rd., P.O. Box 1000
Flanders, NJ, 07836
USA



Rudolph Announces New MetaPULSE-G Copper Film Metrology System


Latest PULSE(TM) Technology offers complete copper process control solution for advanced technology nodes and emerging TSV applications

Flanders, New Jersey (May 11, 2009)-Rudolph Technologies, Inc. (NASDAQ: RTEC), a worldwide leader in process characterization solutions for the semiconductor manufacturing industry, announced today the availability of its new MetaPULSE®-G thin film measurement tool optimized specifically for copper damascene processes at 45nm through 22nm technology nodes and copper via fill in new 3D IC applications. Copper thickness and overburden measurements are critical in optimizing the CMP process that follows deposition during through-silicon via (TSV) manufacturing. The new tool measures 60-80 product wafers per hour with gauge-capable precision and reduced cost of ownership. Rudolph is accepting orders now with initial shipments planned for the fourth quarter of 2009.

"Our MetaPULSE line is the industry standard for thickness measurements on opaque films," commented Jack Kurdock, Rudolph's vice president and general manager of the Metrology Business Unit. "The MetaPULSE-G reinforces that position with superior performance on the copper films that are critical in today's advanced device technologies and new TSV processes. The MetaPULSE has a ten micron spot size that is fully capable of measuring films within advanced test sites and in the active die on product wafers at throughputs that can support high-volume production. Most important, and unlike optical and x-ray techniques, the MetaPULSE measures film thickness using a time-resolved acoustic signal that can be used in active die in the absence of special underlying test pads."

The high-reliability, green wavelength ultrafast laser used in the MetaPULSE-G is optimized for copper applications, delivering higher signal-to-noise ratios and measurement repeatability better than 0.3 percent at throughputs of 60-80 WPH. The system's 10µm X 10µm spot size is small enough to assure measurement capability on product wafers in 30x30µm or smaller test sites.

A TSV 3D package (3D IC) contains two or more chips stacked vertically, with vias through the silicon substrates replacing edge wiring to create an electrical connection between the circuit elements on each chip. TSV technology provides a dramatic increase in the functionality of the device in a very small footprint. Multiple technologies are being explored to form vias during the wafer fabrication process (front-end) and the IC packaging and assembly stage (back-end). Metrology and inspection of the TSVs are critical for ensuring the performance of the 3D ICs and the profitability of the overall manufacturing process.

Rudolph Technologies is a worldwide leader in the design, development, manufacture and support of high-performance process control metrology, defect inspection and data analysis systems used by semiconductor device manufacturers. Rudolph provides a full-fab solution through its families of proprietary products that provide critical yield-enhancing information, enabling microelectronic device manufacturers to drive down costs and time to market. The company has enhanced the competitiveness of its products in the marketplace by anticipating and addressing many emerging trends driving the semiconductor industry's growth. Rudolph's strategy for continued technological and market leadership includes aggressive research and development of complementary metrology and inspection solutions. Headquartered in Flanders, New Jersey, Rudolph supports its customers with a worldwide sales and service organization. Additional information can be found on the company's web site at www.rudolphtech.com.
Print | 
Email |  Comment   Share  
Contacts: View detailed contact information.


 

Post a comment about this story

Name:
E-mail:
(your e-mail address will not be posted)
Comment title:
Comment:
To submit comment, enter the security code shown below and press 'Post Comment'.
 



 See related product stories
More .....
 Newsletters
Industry Market Trends
Has Got It
  • Latest developments
  • Trends
  • Best practices
  • Opinions & Commentary
Get Ahead. Get IMT.
Subscribe Free Today
Subscribe   View Sample

Your Gateway to a Fast Changing World
Product News Alerts
Receive similar stories and other customized news to keep you in the know on the products shaping industry.
Subscribe Free Today
Subscribe   View Sample
 See more product news in:
Laboratory and Research Supplies and Equipment
Test and Measuring Instruments
 More New Product News from this company:
Semiconductor Software provides yield analysis.
Automated Macro Defect Inspection System suits TSV processes.
Wafer Inspection System handles advanced packaging applications. .
Die Sort Classification Software helps find product defects.
Metrology System improves fab productivity.
More ....
 Other News from this company:
Rudolph Receives First Orders for 450 mm Defect Inspection and Thin Film Metrology Systems
Rudolph Fulfills Multiple System Orders for TSV Inspection and Metrology
Rudolph Delivers Run-to-Run Process Control to Bosch Automotive
Rudolph Launches F30 Advanced Macro Inspection Module
Rudolph Wins Multiple System Orders for Its Latest MetaPULSE-G Metrology System
More ....
 Tools for you
Watch Company 
View Company Profile
More news from this company
E-Mail Story
Save Story
Search for suppliers of
Metrology Equipment
Metrology Instruments
Thin Film Measurement Equipment
Join the forum discussion at:
Tools of the Trade


Home  |  My ThomasNet News®  |  Industry Market Trends  |  Submit Release  |  Advertise  |  Contact News  |  About Us
Brought to you by Thomasnet.com        Browse ThomasNet Directory

Copyright © 2012 Thomas Publishing Company
Terms of Use - Privacy Policy