ThomasNet News Logo
Sign Up | Log In | ThomasNet Home | Promote Your Business

Diffusion Enhancer enhances ALD film deposition.

Print | 
Email |  Comment   Share  
September 5, 2012 - Picoflow(TM) lengthens time precursors stay in reaction chamber without risk of precursor back-diffusion to inlets or particle formation. In applications, product allowed conformality and uniformity Atomic Layer Deposition (ALD) metal oxide thin films to be deposited on high aspect ratio (1:300 and 1:1000) trenches on silicon wafers and complicated microchannel structures on silicon chip. Solution has achieved titanium dioxide film thickness variation down to 2 nm for 100 nm thick film.

Picosun's New Picoflow(TM) Diffusion Enhancer Expands the Borders of ALD

(Archive News Story - Products mentioned in this Archive News Story may or may not be available from the manufacturer.)

Picosun Oy
Tietotie 3
Espoo, Finland

Press release date: August 30, 2012

ESPOO, Finland -- Picosun Oy, Finnish, globally operating manufacturer of top-quality Atomic Layer Deposition (ALD) systems reports excellent deposition results with its new Picoflow(TM) diffusion enhancer feature. At customer sites in Asia and Europe, ultra-high conformality and uniformity ALD metal oxide thin films were deposited on extremely challenging high aspect ratio (HAR) trenches on silicon wafers and complicated microchannel structures on silicon chip.

The highest aspect ratios of the trenches were 1:300 and even 1:1000. In such deep structures conventional diffusion is not fast enough to carry the precursors to the bottom of the trench. Picosun's novel, innovative Picoflow(TM) diffusion enhancer feature lengthens the time the precursors stay in the reaction chamber ("stopped-flow") without risk of precursor back-diffusion to the inlets or particle formation. In addition to HAR structures, this feature is very useful also when coating powders or through-porous samples such as microchannel plates. Titanium dioxide film thickness variation down to only plus or minus2 nm for 100 nm thick film has been achieved with Picoflow(TM) technology.

Microchannel silicon chips have several applications in e.g. microfluidistics, sensors and MEMS devices. With ALD thin films they can be protected, passivated or functionalized, changing the hydrophilicity, chemical, electrical or optical behaviour.

Silicon trench structures have a crucial function in today's micro- and nanoelectronics. The level of system integration and the amount of individual components in the devices has increased so much that the traditional 2D component stacking is not enough anymore. Therefore the production has moved towards 3D packaging where the components are piled on top of each other and the necessary connections are realized through so-called through-silicon-via (TSV) structures. TSVs are a prime example of trench structures and typically conductive metal films, seed layers or passivation layers are required to cover uniformly and conformally the insides of the trench. Picosun's Picoflow(TM) expands the possibilities of ALD in these new industrial applications for more efficient future electronics devices.

Picosun Oy is Finland-based, world-wide operating manufacturer of state-of-the-art ALD systems, representing continuity to almost four decades of pioneering, exclusive ALD reactor design and manufacturing. Picosun's global headquarters are located in Espoo, Finland, its production facilities in Kirkkonummi, Finland, its US headquarters in Detroit, Michigan, and its Asian headquarters in Singapore. Today, PICOSUN(TM) ALD tools are in continuous production and R&D use in numerous frontline industries and research organizations across four continents.

Juhana Kostamo, Managing Director, email; tel. +358-50-321-1955
Print | 
Email |  Comment   Share  
Contacts: View detailed contact information.


Post a comment about this story

(your e-mail address will not be posted)
Comment title:
To submit comment, enter the security code shown below and press 'Post Comment'.

 See more product news in:
Paints and Coatings
 More New Product News from this company:
Robot Loading System enhances production ALD systems.
Batch ALD Tool offers fully automated batch processing.
Particle Coating System enhances ALD capabilities.
More ....
| Featured Manufacturing Jobs
 Other News from this company:
PICOSUN(TM) P-300B ALD Production Tool is a Success
Picosun Develops ALD for Graphene-Based Displays and Electronics
Picosun's P-1000 Large Scale Batch ALD Reactor Expands the Limits of ALD Manufacturing
Picosun's High Performance 300-mm ALD Cluster Tool Enters New Generation Memory Market
Picosun Revolutionizes Roll-to-Roll ALD Technology
More ....
 Tools for you
Watch Company 
Company web site
More news from this company
E-mail this story to a friend
Save Story
Search for suppliers of
Diffusion Coatings
Join the forum discussion at:
Hard to Handle

Home  |  My ThomasNet News®  |  Industry Market Trends®  |  Submit Release  |  Advertise  |  Contact News  |  About Us
Brought to you by        Browse ThomasNet Directory

Copyright © 2014 Thomas Publishing Company. All Rights Reserved.
Terms of Use - Privacy Policy

Error close

Please enter a valid email address