Wafer Cleaning Solution utilizes ozonated water.
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Press Release Summary:
LIQUOZON® Smart Ozonated Water Delivery System delivers ultra-pure ozonated water (DIO3) for wafer and substrate cleaning during integrated circuit and thin film processing. Self-contained dissolved ozone delivery system eliminates need for chemical storage, does not generate NOx, and delivers accurate dissolved ozone concentrations up to 65 ppm. Closed loop control ensures delivery at stable concentrations, even at varying flow rates up to 50 l/min.
Original Press Release:
MKS Introduces Environmentally-Friendly, Next-Generation Wafer Cleaning Solution for Cost Reduction in Device Manufacturing
February 18, 2004, Andover, Mass. - MKS Instruments, Inc., (Nasdaq: MKSI), a leading provider of process control technologies for improving productivity in semiconductor and other advanced manufacturing process environments, announced the LIQUOZON® Smart Ozonated Water Delivery System that delivers ultra-pure ozonated water (DIO3) for wafer and substrate cleaning during integrated circuit and thin film processing. Designed specifically for cleaning applications, the LIQUOZON Smart system provides cost-conscious fabs with a smaller footprint, lower gas and DI water consumption, easier installation, and enhanced technology. It is the latest addition to MKS' family of field-proven, high-performance, ultra-clean dissolved ozone delivery systems, which provide an environmentally friendly alternative to conventional process chemicals used in wet wafer cleaning and oxide growth applications.
"Conventional cleaning poses major problems for fabs with their methods of toxic chemical storage and handling, as well as their costly consumption and disposal of those chemicals," said Dr. Christiane Gottschalk, Product Manager for ozone products with the MKS Power and Reactive Gas Products Group. "By using ozonated water as the cleaning agent, the LIQUOZON Smart system offers a clean, safe alternative with no compromise in process performance or reliability, and significant reduction in waste disposal costs. This second-generation LIQUOZON Smart ozone delivery system further lowers wafer cleaning costs for our customers."
The self-contained LIQUOZON Smart system generates ultra-pure ozonated water at the point of use, eliminating the need for chemical storage. The system does not generate NOx, a source of contamination and possible attack of metal piping. It delivers exceptionally high and accurate dissolved ozone concentrations (up to 65 ppm), and closed loop control ensures delivery at stable concentrations, even at varying flow rates (up to 50 liters/minute). Residual ozone that does not dissolve is converted back to oxygen before it is released to the exhaust. The system is virtually maintenance-free with an MTBF greater than 20,000 hours.
MKS's other ozonated water delivery systems in the LIQUOZON product family, LIQUOZON 100 and LIQUOZON XF, handle both wafer cleaning and resist applications.
MKS Instruments is a leading worldwide provider of process control solutions for advanced manufacturing processes such as semiconductor device manufacturing and thin-film manufacturing for flat panel displays, optical storage media, architectural glass and electro-optical products. We also provide technology for medical imaging equipment.
Our instruments, components and subsystems incorporate sophisticated technologies to power, measure, control and monitor increasingly complex gas-related semiconductor manufacturing processes, thereby enhancing our customers' uptime, yield and throughput, and improving their productivity and return on invested capital.
