Software enables global collaborative engineering.

Press Release Summary:



ENOVIA v5.14 extends capabilities of VPM with virtual product 3D representations and configured product management. It delivers engineering-to-manufacturing common change management, and increases operational efficiency by allowing instant review in 3D virtual collocation environment. Capturing of CATIA v5 technological semantics facilitates knowledge reuse and concurrent engineering across global teams.



Original Press Release:



ENOVIA V5.14 Delivers Global Collaborative Engineering Across the Supply Chain



Overview

ENOVIA V5 VPM enables you to visualize a product in 3D inside the VPM Navigator window for easier session building of large products.

In addition, new configuration and change management capabilities are now available for immersive configured product design.

ENOVIA V5.14 reinforces the transformation of ENOVIA LCA to Web-based, easy to learn and deploy applications on top of enterprise middleware architecture. The new LCA Navigator provides applications for product lifecycle management, 2D/3D viewing, and instant collaboration within one single user interface.

Product, Process, and Resource (PPR) impact analysis provides manufacturing awareness in DELMIA of proposed design changes in ENOVIA. Process planners can investigate the new design's manufacturability before allowing it to be released to manufacturing.

A breakthrough in the way CATIA V5 technological semantics is captured within ENOVIA V5 VPM improves knowledge reuse and concurrent engineering across global teams.

New VPM engineering exchange reconciliation tool enables relational design across the supply chain. This capability maintains CATIA V5 design associativity, enabling OEMs and suppliers to exchange product definition in heterogeneous PLM environments.

New VPM Instant Collaboration increases operational efficiency by allowing instant review in a rich 3D, virtual collocation environment. Product definition exchanges between OEMs, risk-sharing partners and remote sites are also streamlined with the new partial replication capability.

Large assembly design reviews are more easily conducted in V5.14 with optimized memory consumption, 64-bit processor support, and a new DMU presentation capability.

Key prerequisites

ENOVIA 3d com/DMU

Workstation platforms

· Intel(TM)-based Windows(TM) workstations
· IBM RS/6000®
· HP-UX 9000 Series
· Sun Solaris SPARC system family
· Silicon Graphics (SGI)

ENOVIA LCA/V5 VPM

Operating systems

· For server platforms
- Windows 2000 or Windows XP
- AIX® 5L
- HP-UX
- SGI IRIX
- Sun Solaris
· For client platforms
- Windows 2000 or Windows XP
- AIX 5L
- HP-UX
- SGI IRIX
- Sun Solaris

A properly sized database that uses either DB2® or Oracle

Planned availability dates

· November 5, 2004, ENOVIA V5.14 Solutions

· November 26, 2004, ENOVIA Web-based Learning Solutions V5.14

At a glance

ENOVIA V5.14:

· Extends the capabilities of the next generation VPM with virtual product 3D representations and configured product management

· Transforms ENOVIA LCA to Web-based, easy to use and deploy applications based on enterprise middleware architecture

· Delivers engineering to manufacturing common change management

· Delivers a breakthrough in CATIA technological semantics capture and reuse within the Engineering Hub

· Increases operational efficiency by allowing instant review in a rich 3D virtual collocation environment

· Introduces VPM engineering exchange reconciliation tool that enables relational design across the supply chain

· Improves multisite support by enabling partial replication

· Facilitates large assembly, design review process deployability

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