Plasma-Therm and Smoltek Commit to Carbon-Based Technology Development

Smoltek have entered a partnership to develop carbon-based growth and device technologies. Carbon nanofibers (CNF) have been demonstrated as having applications for micro-bumps, enhanced thermal interface material and layer-to-layer micro-vias. Each of these applications addresses important needs in evolving semiconductor chip fabrication and packaging, provides specific advantages over existing technologies, and is CMOS-process compatible. New applications such as CNF-enhanced electrodes for supercapacitors, on-chip signal filtering capacitors, and antireflective films for optical uses are also emerging as the CNF technology develops.

Over the last 8 years Smoltek has built a strong IP portfolio available for licensing, providing a platform technology to enable controlled growth of substrate-based nanostructures and their related implementation in devices. By joining with Plasma-Therm, a leading semiconductor plasma processing equipment supplier, R&D efforts will accelerate, and more importantly, begin transferring the technology to an industrial platform.

Abdul Lateef, Plasma-Therm CEO, noted, "This relationship provides an important integration step that links fundamental material science and device-related structures with an accepted plasma processing platform." He continued, "We are excited to make this investment and commitment in a technology that has such capability to change our industry."

"Working closely at this stage with an equipment supplier is an industrial confirmation of our IPs and enables us to continue to secure development contracts with existing and new customers," commented Anders Johansson, Smoltek CEO. Furthermore, he noted, "Our CNF-based technology has the potential to open our participation in a variety of very large markets. Having the appropriate processing hardware in this phase is highly valuable."

About Smoltek

Established in 2006 in Gothenburg Sweden, Smoltek has focused on nanotechnology for the next generation of electronics and industrial products. Key to their vision is the implementation of carbon nanofibers for a variety of uses that demand smaller, faster, and cheaper solutions for advanced microelectronic circuits. Their IP portfolio covers core elements on how to control growth of substratebased nanostructures, their properties, and how to utilize such nanostructures for specific applications and devices. For further information, please visit

About Plasma-Therm

Established in 1974, Plasma-Therm is a U.S. manufacturer of advanced plasma-processing equipment, focusing on research and development systems to high-volume production in specialty semiconductor markets, including solid-state lighting, power, data storage, renewable energy, MEMS, nanotechnology, photonics, wireless communication and advanced photomask etching. Offering leading etching and deposition technologies and solutions for these markets, customers have recognized Plasma-Therm for the last 15 years for their products and service with VLSIresearch awards. Sales and service locations throughout North America, Europe and Asia Pacific meet the diverse needs of Plasma-Therm's global base of over 600 customers. For further information, please visit


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