PECVD System offers ashable hard mask process configuration.
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Press Release Summary:
Configured on VECTOR Extreme(TM) platform, AHM technology employs RF power configuration, optimized process gas chemistry, and integrated post-deposition edge bevel film removal to produce quality films with integration for 45 nm manufacturing and below. System is capable of providing memory manufacturers throughputs in excess of 150 wafers/hr.
Original Press Release:
Novellus Systems Extends Ashable Hard Mask Process Technology to the Vector Extreme Platform
High-throughput Platform Provides Memory Megafabs with Lowest-cost AHM Solution
SAN JOSE, Calif., July 14 /- Novellus Systems, Inc. (NASDAQ:NVLS) today announced the availability of an ashable hard mask (AHM) process configuration for the company's high-productivity VECTOR Extreme(TM) PECVD platform. The new VECTOR Extreme AHM system allows Novellus to participate in the rapidly growing AHM market while meeting the productivity demands of the emerging memory megafabs. Introduced in July 2007, the VECTOR Extreme platform has enjoyed rapid market acceptance, with more than 30 systems to be installed worldwide by the end of 2008.
As configured on the VECTOR Extreme, Novellus' innovative AHM technology employs a unique RF power configuration, optimized process gas chemistry and integrated post-deposition edge bevel film removal (EBR) to produce the highest-quality films with the easiest integration for 45nm manufacturing and below. The VECTOR Extreme AHM system is capable of providing memory manufacturers throughputs in excess of 150 wafers per hour. Due to its high etch selectivity and film transparency, Novellus' AHM on the VECTOR Express platform is already the film of choice at a number of leading-edge memory device manufacturers.
"The VECTOR Extreme AHM system represents an exciting marriage of the industry's most advanced AHM process technology with the highest-throughput PECVD platform on the market," said Tim Archer, senior vice president and general manager of Novellus' PECVD business unit. "With its high throughput, low cost of ownership and process tunability, the VECTOR Extreme AHM system is well positioned to meet the production requirements of memory megafabs."
The AHM market segment is expected to grow to $300 million by 2012, driven by the challenges of advanced lithography. AHM films, deposited in a PECVD reactor, aid in pattern transfer and provide superior critical dimension control during etch compared to standard 193nm photoresists.
The VECTOR Extreme platform will be on display during SEMICON West at the Novellus exhibit in the Yerba Buena Center for the Arts, July 15-17.
About the VECTOR platform:
Introduced in 2000, VECTOR revolutionized the 300mm PECVD market. The industry-leading system is capable of depositing all dielectric films required for advanced dual damascene structures, and is the production tool of choice with the largest installed base of 300mm systems. The tool's simple design ensures high system reliability and uptime.
VECTOR Extreme was launched in July of 2007 for the deposition of comparatively thick SiH4 and TEOS-based dielectric films used in memory chips. Capable of throughputs of up to 250 wafers per hour, the VECTOR Extreme platform has seen rapid adoption in some of the world's largest memory manufacturing fabs, where low cost of ownership and productivity are paramount.
The VECTOR suite of products now includes VECTOR Express, VECTOR Express AHM, VECTOR Extreme and VECTOR Extreme AHM.
About Novellus:
Novellus Systems, Inc. (NASDAQ:NVLS) is a leading provider of advanced process equipment for the global semiconductor industry. The company's products deliver value to customers by providing innovative technology backed by trusted productivity. An S&P 500 company, Novellus is headquartered in San Jose, Calif. with subsidiary offices across the globe. For more information, please visit http://www.novellus.com/.
VECTOR Extreme is a trademark of Novellus Systems, Inc.
CONTACT: Pushpita Prasad of Novellus Systems, Inc., +1-408-943-9700, pushpita.prasad@novellus.com
