Mass Flow Controller optimizes source gas utilization.
Press Release Summary:
Low Pressure πMFC offers precise control of gas flows from 1-20 sccm over wide pressure range with source gas delivery pressure as low as 4 torr. Controller can be configured for different primary implant gases such as arsine, phosphine, and boron trifluoride, and valve and sensor designs offer zero stability and accuracy for all flow conditions. Targeted for semiconductor ion implant applications, MFC footprint and control I/O are compatible with existing gas lines.
Original Press Release:
MKS' Low Pressure πMFC Controls Low Flow, Safe Delivery Source Gases
Wilmington, MA, October 19, 2006 - MKS Instruments, Inc. (Nasdaq: MKSI), a leading provider of process control technologies for improving productivity in semiconductor and other advanced manufacturing processes, has introduced the Low Pressure πMFC Mass Flow Controller for maximum utilization of Safe Delivery Source gases used in semiconductor ion implant applications. It offers accurate and precise control of low gas flows, from below 1 sccm up to 20 sccm, over a wide pressure range with source gas delivery pressure as low as 4 Torr.
Implementation of the Low Pressure πMFC increases source gas utilization, reducing the frequency of source gas cylinder changes, improving tool uptime and COO. The πMFC's multi-gas, multi-range feature allows users to configure it for different primary implant gases such as arsine, phosphine, boron trifluoride and others, keeping inventory costs down. The πMFC operates with a very low pressure drop across the device. The patented valve and sensor designs offer exceptional zero stability and accuracy for all flow conditions while maintaining the ability to rapidly achieve setpoint and repeatably control the gas flow. Using its straightforward Ethernet interface and a PC, the embedded configuration and diagnostics software lets users check MFC functionality without removing the MFC. Standard-sized MFC footprint and control I/O are compatible with existing gas lines for easy integration and operation.
About MKS
MKS Instruments is a leading worldwide provider of process control solutions for advanced manufacturing processes such as semiconductor device manufacturing and thin-film manufacturing for flat panel displays, optical storage media, architectural glass and electro-optical products. We also provide technology for biopharmaceutical and medical imaging equipment.
Our instruments, components and subsystems incorporate sophisticated technologies to power, measure, control and monitor increasingly complex gas-related semiconductor manufacturing processes, thereby enhancing our customers' uptime, yield and throughput, and improving their productivity and return on invested capital.
Corporate contact:
Lisa Condon
Phone: 978-284-4050
Fax: 978-284-4999
Lisa_Condon@mksinst.com
