Press Release Summary:
Diamonex G-2 CD Source(TM) provides substrate cleaning, etching, ion-assisted deposition, and direct deposition solution. It features front-change hollow-cathode and includes keyed components. To reduce maintenance time, product has quick-change anode surface and is manufactured with internal ceramic components. Broad-beam source, with grid-less design, provides 170+ hours of operation in harsh, chemically reactive, or deposition environments.
Original Press Release:
Morgan Advanced Ceramics Introduces Its Next-Generation Diamonex® "G-2" CD Source(TM)
Morgan Advanced Ceramics (MAC), a world-wide leading supplier of innovative material and process solutions for the medical, telecommunications, semiconductor and aerospace markets, introduces its next-generation Diamonex CD Source. The "G-2" CD Source features a simplified design and offers reduced maintenance and increased reliability for a cost-effective substrate cleaning, etching, ion-assisted deposition and direct deposition solution.
The "G-2" CD Source features a front-change hollow-cathode, reducing maintenance requirements for increased uptime and product throughput. The simplified design, with fewer parts, includes "keyed" components for reliable, fast disassembly and re-assembly. To further reduce maintenance time, the "G-2" CD Source provides a redesigned, quick-change anode surface. Manufactured with advanced internal ceramic components for superior reliability, the "G-2 CD" Source provides long-term (170+ hours) operation in harsh, chemically reactive or deposition environments.
The Diamonex "G-2" CD Source is a high current, low energy, broad-beam source. The grid-less design provides high current densities of low-voltage ions for gentle cleaning or powerful etching, and ensures there is no grid erosion or clogging to contaminate the process or produce particles. The Diamonex "G-2" CD Source is capable of direct deposition of diamond-like carbon films with superior properties - very low coefficient of friction and hardness up to 40 GPa - as well as other optical materials such as silicon dioxide, titanium dioxide, silicon nitride and amorphous silicon.
Additionally, the source has no process gas restrictions, making it ideal for ion-assisted deposition, etching and materials development applications. For high-pressure applications, extended voltage ranges are available. Unlike many other ion sources, the Diamonex G-2 CD Source employs an electromagnet to increase process flexibility, allowing for detailed optimization of material properties. Its SEMI-certified DC power supplies ensure long-term stable operation.
About Morgan Advanced Ceramics
Morgan Advanced Ceramics (MAC) has a comprehensive range of Ceramic materials, from which its products are manufactured. Supplying to a variety of demanding markets, MAC has established an enviable reputation for providing value-added solutions through world-class research and development, innovative design and, perhaps most important of all, application engineering.
As a subsidiary of The Morgan Crucible Company, MAC forms part of the Morgan Technical Ceramics Group. The Group includes Morgan Electro Ceramics and from manufacturing locations in North America, Europe and Asia, it supplies an extensive range of products, including ceramic components, braze alloys, ceramic/metal assemblies and engineered coatings. For more information on Morgan Advanced Ceramics visit www.morganadvancedceramics.com or contact one of our sales offices below:
UK & Eire
Morgan Advanced Ceramics, Bewdley Road, Stourport, Worcestershire, DY13 8QR; Tel: +44 1299 872210; Fax: +44 1299 872218; Email: email@example.com
Morgan Advanced Ceramics, BahnhofstraÃŸe 16, D-85774 MÃ¼nchen-UnterfÃ¶hring, Germany; Tel: +49 89 416098-510; Fax: +49 89 416098-421; Email: firstname.lastname@example.org
Morgan Advanced Ceramics Inc, 26 Madison Road, Fairfield, NJ 07004, USA; Tel: 1 800 433 0638; Fax: 1 973 808 2257; Email: email@example.com
Morgan Advanced Ceramics, 158 Jiajian Road, Jiading, Shanghai 201818, People's Republic of China; Tel: +86 21 5951 0809; Fax: +86 21 5951 1241; Email: firstname.lastname@example.org