Imaging Lenses offer high resolution and large FOV.
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Press Release Summary:
Multi-Element UV Imaging Lenses include doublet, triplet, quadruplet, and 6-element objectives. Doublet objectives are wavelength flexible and can be used from 2-100x. Lenses with more elements are less flexible, since they are corrected for specific wavelengths and magnifications. High-resolution, 15x imaging lens provides 1.5 micron spot size over 2.5 x 2.5mm FOV resulting in low taper angle and sharp micromachining in plastics, ceramics, and sapphire.
Original Press Release:
JPSA Laser Announces Availability of Multi-Element UV Imaging Lenses
Hollis, New Hampshire, USA -- JPSA Laser announces the availability of Multi-Element UV Imaging Lenses for high resolution and large FOV (field of view) materials processing applications. Designed and manufactured by JPSA Laser, these high precision UV excimer lenses and lens systems are field-proven in JPSA's laser job shop and are designed to obtain the greatest process efficiency and cost savings for UV laser processing. These multi-element UV imaging lenses include doublet, triplet, quadruplet, and six-element objectives. JPSA provides custom design and assembly of high performance imaging objectives for mask imaging materials processing applications; JPSA also stocks various lenses for 248nm processing, as well as a full range of doublet objectives for 193nm.
Examples of JPSA multi element imaging lenses include the following:
50mm 80mm and 100mm 150mm doublet objectives 193nm 248nm;
5X 150mm EFL telecentric triplet lens 0.02NA 248nm 1 cm FOV;
4X quadruplet telecentric imaging lens 92mm EFL 0.09NA 248nm .25cm FOV;
5x six element telecentric imaging lens 266 mm EFL 0.06NA 2 cm FOV 248nm; and
15X high-resolution imaging lens 70mm EFL 0.132NA 0.25cm FOV 248nm.
UV doublet objectives are useful for a wide range of applications and are wavelength flexible. These doublets can be used from 2X to 100X and provide corrected imaging performance for numerous applications in mask imaging applications and micro machining and thin film patterning.
Purpose-designed lenses with more elements (such as quadruplet) are less flexible, since they are corrected for specific wavelengths and magnifications as well as telecentric or conventional imaging applications. Such lenses perform better at specific design parameters for low distortion to less than 0.001% mask grid distortion. They offer high levels of telecentricity for applications such as ink jet nozzle drilling and increased FOV.
The JPSA 15X high resolution imaging lens provides 1.5 micron spot size over a 2.5mm by 2.5mm FOV resulting in a low taper angle, ultra sharp micromachining features in materials such as plastics ceramics and sapphire. On-target fluences of over 20 j/cm2 can be achieved for hard materials and lower energy densities of 0.5 to 1 j/cm2 are used in polymers for sharp, low taper, high-resolution micro machining in polymers.
JPSA products and services include UV excimer and DPSS laser micro machining systems, UV and VUV laser beam delivery systems, UV laser materials processing development, optical damage testing, and excimer laser refurbishment services. JPSA Laser operates a high-performance UV laser job shop as well as a systems engineering and manufacturing business. For more information, visit www.jpsalaser.com, or contact the company at 17D Clinton Drive, Hollis, NH 03049 USA, Tel. 603.595.7048, fax 603.598.3835. E-mail: jsercel@jpsalaser.com.
