Gas Analyzer detects trace level contamination in bulk gases.
Press Release Summary:
MultiGas? Purity? Analyzer is composed of process FTIR spectrometer, high-optical throughput sampling cell, and applications-specific analysis software. It provides real-time, low-level impurity detection in high purity ammonia and nitrogen trifluoride to improve LED/semiconductor device yields and bulk gas production.
Original Press Release:
MKS Announces Industry-first Point-of-Use Gas Analyzer for Trace Level Contamination Detection in Bulk Gases
Purity? Analyzer provides real-time, low-level impurity detection in high purity ammonia and nitrogen trifluoride to improve LED/semiconductor device yields and bulk gas production
June 4, 2003, Andover, Mass.? MKS Instruments, Inc., (Nasdaq: MKSI), a leading provider of products that measure, control, power, and monitor critical parameters of advanced manufacturing process environments, announces that in tests performed in a production environment at a major U.S. bulk gas supplier, its MultiGas? Purity? Analyzer was proven to detect ppb levels of water in a high purity ammonia (NH3) gas stream. This achievement represents the industry?s first point-of-use gas analysis system that is truly suitable for real-time detection of trace impurities in bulk NH3 gas used in the manufacturing of gallium nitride-based high brightness blue and white LEDs.
Dr. Peter Rosenthal, General Manager of MKS On-Line Products (part of the MKS Instruments & Controls Product Group) commented: ?Detecting trace water and other oxygen-containing contaminants in NH3 gas during metal organic chemical vapor deposition (MOCVD) is critical, as water can cause up to 90% reduction in LED yield. Now, for the first time, continuous process monitoring of ppb levels of water and other contaminants in ammonia is possible. The low-level detection capability of the Purity Analyzer provides bulk gas suppliers and device makers with a means to detect unacceptable impurity levels before process problems occur, thereby reducing contamination-related risks while maintaining high device yields.?
In a separate application accomplishment, the Purity Analyzer was also proven to detect ppb levels of hydrofluoric acid (HF) and water in high purity bulk nitrogen trifluoride (NF3). ?HF and water are of particular interest to bulk gas suppliers and device manufacturers, as fluctuations in those contaminants can cause etch rate variations in chamber clean applications,? said Dr. Rosenthal. ?By continuing our efforts to help solve real process problems for fabs and bulk gas suppliers in detecting impurities that can adversely affect their processes, we enable them to have tighter process control and to continue their yield improvement activities."
The MKS MultiGas Purity Analyzer is composed of a process FTIR spectrometer, high-optical throughput sampling cell, and applications-specific analysis software. These integrated components, along with automated bake-out functionality, provide unmatched precision and accuracy for bulk gas contaminant monitoring.
For more information, call MKS at (888) FTIR-888 or (860) 291-0719, or visit us online at www.mksinst.com.
MKS Instruments, Inc. is a leading worldwide provider of instruments and subsystems that measure, control, power, and monitor critical parameters of advanced manufacturing environments. MKS products are used in a diverse array of manufacturing, such as semiconductor, flat panel display, data storage, automotive, medical imaging, glass coatings, and gas lasers. To enable productivity, MKS supports its OEM and end-user customers around the world with best-in-class products, extensive process applications expertise, world-class manufacturing, and technical support.