Deposition Tool suits low-defect thin film markets.
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Press Release Summary:
Flexible dual-ion beam reactive-sputtering tool provides platform for multi-layer film development as well as tightly controlled production deposition. Low-defect, high-uniformity tool incorporates multi-axis substrate/sputter target relative positioning control, 4-material target tooling, substrate rotation speed control, and high order polynomial process variable control. It is suited for development of low-defect mask blank coatings.
Original Press Release:
Rohwedder introduces new Flexible, Reliable, Dual Ion Beam Deposition Tool
OVIEDO, FL., April 16th, 2003 (BUSINESS WIRE) ---Rohwedder, Inc. (Frankfurt, Stuttgart: RWD) will introduce a new Low Defect, High Uniformity, Dual Ion Beam Deposition Tool at the upcoming 46th Annual SVC Technical Conference in San Francisco, California.
In a joint-development program, the teams of Rohwedder, Inc. (Orlando, FL) and OSMIC, Inc. (Auburn Hills, MI) have designed and built a flexible dual-ion beam reactive-sputtering tool that is now available to the market. The tool's primary target is the development of low-defect mask blank coatings, however, the deposition tool has applications in other high-quality, low-defect thin film markets, such as lithography, nanotechnology, wear and optical coatings. The highly flexible tool provides a platform for multi-layer film development as well as tightly controlled production deposition. Features of the machine include:
o multi-axis substrate/sputter target relative positioning control,
o four-material target tooling, substrate rotation speed control, and
o high order polynomial process variable control.
The first deposition tool and robotic substrate handler was integrated and delivered to OSMIC earlier this year.
"The strategic alliance represented by Rigaku, OSMIC and Rohwedder represents a depth of knowledge unmatched in the industry. Collectively this alliance represents world leaders in a wide range of services including deposition tool design, automation, process and material development, multilayer coating expertise, X-ray metrology tool design and manufacturing", said Dr. John McGill, President of OSMIC, Inc., a Rigaku company.
According to Birgit (Bee) R. Westphal, Chief Executive Officer and Member of the Board, North America Rohwedder, Inc., "with the development cycle for the semiconductor market shortening, we believe that partnerships like we have with OSMIC are essential for success and will prove to be a natural spin-off of the consolidation that we see in the market place." The partnership with OSMIC has been on-going since the mid-1990's when Rohwedder delivered a state-of-the-art, fully-automated, inline vacuum deposition system to OSMIC which is currently being used to produce high-grade optical coatings at OSMIC.
OSMIC, Inc. of Auburn Hills, Michigan is a world leader in the development and manufacture of precision optics for life sciences, semiconductor and microlithography markets. Critical analytical techniques used for new generations of semiconductor devices are enabled through use of OSMIC's optics. Sputtered multilayers provided by OSMIC are built into advanced lithography masks used for both the current and next generation lithography. OSMIC's high-quality mask blanks enable printing of smaller features needed for advanced semiconductor devices. OSMIC's products are also key components of instrumentation used for elemental and structural analysis of materials, pharmaceuticals and biological specimens.
Rohwedder, Inc., located in Orlando, Florida is a subsidiary of Rohwedder AG, a leading designer and manufacturer of a broad range of automation technologies. The individual companies of Rohwedder are recognized internationally for vacuum, robotics, assembly automation, vision and material handling and provide automated solutions for the electronics, telecommunications, automotive, aerospace/military, consumer products and medical/pharmaceutical industries. Rohwedder employs approximately 800 skilled personnel worldwide.
