Product News: Waste Handling Equipment, Chemical Processing & Waste Management, Materials & Material Processing

UV-Ozone Cleaning System produces results within minutes.

Share Like Tweet Add Email

Press Release Summary:

April 15, 2014 - Along with UV grid lamp for uniformity, HELIOS-500 features digital process timer for accurate control and drawer loading sample stage that accommodates up to 5 x 5 in. substrates. Included pedestals allow for adjusting distance between UV source and substrate, while built-in hour-counter records total hours of UV lamp usage for maintenance purposes. Within minutes, system can achieve near atomically clean surfaces using 185 and 254 nm UV wavelengths and without damaging devices.

UVOTECH Systems, Inc.

P.O. Box 1323, Newark, CA, 94560, USA

Original Press Release

UVOTECH Introduces HELIOS-500: A New UV-Ozone Cleaning System

Press release date: April 1, 2014

(Concord, CA) - UVOTECH Systems, Inc., a manufacturer and distributor of surface treatment equipment, announced the release of a new UV-Ozone Cleaning System, Model HELIOS-500. This is the first product in the HELIOS series of UV-Ozone Cleaners by UVOTECH.

The HELIOS-500 system is designed to be very compact, lightweight and economical. It includes an ultraviolet grid lamp for increased uniformity as well as a digital process timer which allows more accurate control over the process time. The drawer loading sample stage can accommodate up to 5”x5” substrates. Included pedestals allow for adjusting the distance between the UV source and substrate. This system also comes with a built-in hour-counter which will record the total hours of the UV lamp usage for maintenance purposes.

The UV Ozone Cleaning process is a photo-sensitized oxidation process in which the contaminant molecules of photo resists, resins, human skin oil, cleaning solvent residues, silicone oils, and flux are excited and/or dissociated by the absorption of short wavelength UV radiation. Atomic oxygen is simultaneously generated when molecular oxygen is dissociated by 185nm and ozone by 254nm ultraviolet wavelengths. The 254nm UV radiation is absorbed by most hydrocarbons and also by ozone. The products of this excitation of contaminant molecules react with atomic oxygen to form simpler, volatile molecules, which desorbs from the surface. Therefore, when both UV wavelengths are present atomic oxygen is continuously generated, and ozone is continually formed and destroyed.

Using a UV-Ozone Cleaner, near atomically clean surfaces can be achieved in minutes without any damage to your devices. This fast method of obtaining ultra-clean surfaces free of organic contaminants on most substrates, such as quartz, silicon, gold, nickel, aluminum, gallium arsenide, alumina, glass slides, etc. can easily be achieved by utilizing a UV-Ozone Cleaner in just a few minutes.

UVOTECH Systems, Inc., headquartered in Concord, CA, is a manufacturer and distributor of surface treatment equipment for the Semiconductor, Electronics, Medical, and Photovoltaic industries. Current products include UV-Ozone Cleaning Systems, Plasma Cleaners, RIE and ICP Etching Systems, UV Curing Machines and Molecular Printers used mainly in the manufacturing of Biosensors.

UVOTECH Systems, Inc.
1485 Civic Court
Concord, CA  94520
USA
Phone:  (925) 356-6242
http://www.uvotech.com

Share Like Tweet Add Email

Comments

comments powered by Disqus