Sputtering Targets

Circular Sputtering Source offers UHV-compatible option.
Sputtering Targets

Circular Sputtering Source offers UHV-compatible option.

Designed to meet requirements of R&D community, Torus® Mag Keeper™ includes quick target change feature, optimized cooling design, and low operating pressure capability. Circular magnetron sputtering source is engineered with no O-rings and all ceramic insulators. For magnetic film deposition, Mag Keeper offers high-strength magnet options for sputtering up to 3 mm thick Fe. Product comes in...

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Sputtering Targets

H.C. Starck's Thin Film PV Solutions on Display at Society of Vacuum Coaters TechCon 2011

NEWTON, Mass. -- With increasing global interest in safe and sustainable energy sources, a bright future is shaping-up for U.S. based thin film PV production. With these developments, a local presence coupled with global reach is critical to efficiently and effectively meet the rapidly increasing demand for sputtering targets. With over 30 locations worldwide including the U.S., Asia, and Europe,...

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Sputtering Targets

S-Bond Joining Materials and Services for the Manufacture of Sputtering Targets

S-Bond® active solders enable the joining of dissimilar metals and ceramics to each other and to other metals. S-Bond's patented alloys have active elements such as titanium and cerium added to Sn-Ag, Sn-In-Ag, and Sn-Bi alloys to create a solder that can be reacted directly with the metallic and/or ceramic surfaces prior to bonding. S-Bond filler metal alloys produce reliable joints with...

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Sputtering Targets produce high-purity SiC films.
Sputtering Targets

Sputtering Targets produce high-purity SiC films.

Manufactured by chemical vapor deposition process, Silicon Carbide Sputtering Targets consist of homogenous, monolithic material with no particles. High density and lack of porosity results in negligible outgassing of target and makes it suitable for use in ultra-high vacuum conditions. Ranging in size from 3-20 in. diameter, targets are 99.9995% pure, enabling production of highly pure, uniform...

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Expanded Line of Sputtering Targets
Sputtering Targets

Expanded Line of Sputtering Targets

Oakdale, PA...February 28, 2008... Sputtering targets from Goodfellow Corporation are available in 62 different metals and alloys, as well as compounds such as borides, carbides, fluorides, nitrides, oxides, selenides, silicides, sulphides, and tellurides. In addition, the surfaces of flat sheets up to 80 mm x 400 mm can be heat treated, remelted, or alloyed using a continuous thermal process....

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Sputtering Targets

Rotatable Targets assist thin film solar cell manufacturers.

High-density (99%+) CIG rotatable sputtering targets aid thin film solar manufacturers with casting of ternary alloy CuInGa (CIG). Density of material promotes control and material utilization. With 70% material utilization on rotatable and 25% on planar, spent targets can be reclaimed and re-cast to make new target. Process also works with materials such as In, InSn, Sn, Zn, Al, and SAC.

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