ReVera Retires the RVX 1000(TM), the Semiconductor Industry's First Production Capable XPS System
Santa Clara, CA - ReVera will discontinue the RVX 1000, effective December 31, 2012. The RVX 1000, ReVera's first product, has been in service for over eight years and was originally developed to qualify transistor gate oxides, such as plasma SiON, and rapidly became the first production metrology tool to measure film composition. The product was also the first production-capable platform to use...
Read More »ReVera Retires the RVX 1000(TM), the Semiconductor Industry's First Production Capable XPS System
Santa Clara, CA - ReVera will discontinue the RVX 1000, effective December 31, 2012. The RVX 1000, ReVera's first product, has been in service for over eight years and was originally developed to qualify transistor gate oxides, such as plasma SiON, and rapidly became the first production metrology tool to measure film composition. The product was also the first production-capable platform to use...
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Mask Alignment System manufactures high-brightness LEDs.
Equipped with high-intensity UV light source and optional filter fan unit, EVG620HBL Gen II provides wafer throughput up to 165 6-in. wafers/hr. Robotic handling layout with wafer mapping capability supports demand for wafer traceability, while microscope supports automated mask pattern search, minimizing mask setup and change time. With recipe-controlled microscopes, illumination spectrum can be...
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Mask Alignment System manufactures high-brightness LEDs.
Equipped with high-intensity UV light source and optional filter fan unit, EVG620HBL Gen II provides wafer throughput up to 165 6-in. wafers/hr. Robotic handling layout with wafer mapping capability supports demand for wafer traceability, while microscope supports automated mask pattern search, minimizing mask setup and change time. With recipe-controlled microscopes, illumination spectrum can be...
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How Manufacturing Automation Can Reduce Workplace Injuries and Improve Morale
To learn more about how automation can solve your workplace issues, download the full white paper.
Read More »Plasma-Therm Receives a Repeat Multi-Module Versaline Order from Wireless Chip Manufacturer
St. Petersburg, FL - Plasma-Therm LLC, a global supplier of plasma process equipment, is pleased to announce the sale of another multi-chamber VERSALINE-® production system for etch and deposition to a leading North American wireless compound semiconductor manufacturer. The process modules include an Inductively Coupled Plasma (ICP) etcher for additional capacity for advanced backside GaAs via...
Read More »Plasma-Therm Receives a Repeat Multi-Module Versaline Order from Wireless Chip Manufacturer
St. Petersburg, FL - Plasma-Therm LLC, a global supplier of plasma process equipment, is pleased to announce the sale of another multi-chamber VERSALINEÃ-® production system for etch and deposition to a leading North American wireless compound semiconductor manufacturer. The process modules include an Inductively Coupled Plasma (ICP) etcher for additional capacity for advanced backside GaAs...
Read More »Silex Microsystems and A.M. Fitzgerald & Associates Reduce MEMS Development Time by 50%
Multi-Year Collaboration Enables Fast Commercialization of MEMS Designs Through the Silex Sil-Via-® Platform JARFALLA, Sweden and BURLINGAME, Calif. - Silex Microsystems, the world's largest pure-play MEMS foundry, and A.M. Fitzgerald & Associates ( AMFitzgerald"), a MEMS product development firm, today announced they have successfully reduced the traditional development time of MEMS devices for...
Read More »Silex Microsystems and A.M. Fitzgerald & Associates Reduce MEMS Development Time by 50%
Multi-Year Collaboration Enables Fast Commercialization of MEMS Designs Through the Silex Sil-ViaÃ-® Platform JARFALLA, Sweden and BURLINGAME, Calif. - Silex Microsystems, the world's largest pure-play MEMS foundry, and A.M. Fitzgerald & Associates ( AMFitzgerald"), a MEMS product development firm, today announced they have successfully reduced the traditional development time of MEMS devices...
Read More »UMC and Synopsys Collaborate to Develop DesignWare IP for 28-Nanometer Technology
Collaboration on Embedded Memory and Logic Library for UMC's Enhanced Poly SiON 28HLP Process Enables Creation of High-Performance, Low-Power SoCs HSINCHU, Taiwan and MOUNTAIN VIEW, Calif. - United Microelectronics Corporation (UMC) (NYSE: UMC; TWSE: 2303), a leading global semiconductor foundry, and Synopsys, Inc., (Nasdaq: SNPS), a world leader in software and IP used in the design,...
Read More »UMC and Synopsys Collaborate to Develop DesignWare IP for 28-Nanometer Technology
Collaboration on Embedded Memory and Logic Library for UMC's Enhanced Poly SiON 28HLP Process Enables Creation of High-Performance, Low-Power SoCs HSINCHU, Taiwan and MOUNTAIN VIEW, Calif. - United Microelectronics Corporation (UMC) (NYSE: UMC; TWSE: 2303), a leading global semiconductor foundry, and Synopsys, Inc., (Nasdaq: SNPS), a world leader in software and IP used in the design,...
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Sentry Equipment Introduces New Compact Hygienic Automatic Sampler
As a leader in industrial sampling equipment at Sentry Equipment, our success is built on a history of innovation and designs that epitomize value and efficiency. The new Hygienic Automatic Sampler is another example of our dedication to developing quality engineered products. To learn how this product can streamline the sampling process for dry, free-flowing materials, see our new video.
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