Bilayer Photoresist handles sub-65nm lithography.
Bilayer photoresist uses silicon polymer in imaging layer to optimize etch selectivity for addressing demands of sub-65nm lithography. Level of silicon content also eliminates need for separate hardmask layer and accompanying process steps. Photoresist exhibits no detectable levels of outgassing during lithography process, and etch selectivity lends to successful transfer of smaller circuit...
Read More »Dry Photoresists provide wafer bumping.
Series WB Photoresists offer alternative for wafer bumping versus liquid resists. Thick, dry photoresists, ranging from 50-100 microns, are applied in one step, with no solvents or drying required. Range of formulations are available for use in lead-free, photostencil, and standard electroplating applications.
Read More »What Affects the Price of Electronics Manufacturing?
The eBook provides an overview of designing for manufacturability, exploring what it means and discussing what to do to design costs out of electronic manufacturing projects.
Read More »Complete Water Solutions Offers Wide Range of Water Treatment Equipment
Complete Water Solutions provides full installation tailored to your water treatment needs. Check out the video to learn more.
Read More »