SF-100 Used for Micro-Numbering of Individual Die and Other Components
St. Petersburg, Florida, April 27, 2006: Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced a new, unique application of the SF-100 system for micro-numbering of individual components. The SF-100 is a unique, maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning, LLC from the University of South Florida. Smart...Read More »
Intelligent Micro Patterning Provides SF-100 to Purdue University for Development of Three Dimensional MicroScale Rapid Prototyping
Intelligent Micro Patterning Provides SF-100 to Purdue University for Development of Three Dimensional MicroScale Rapid Prototyping St. Petersburg, Florida, April 5, 2006: Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced the sale of an SF-100 maskless exposure system to the Department of Electronic and Electrical Engineering at Purdue University, West Lafayette, Indiana. The...Read More »
Analyzer facilitates lithography cell qualification.
Integrated with Archer overlay, eCD CD SEM, and SpectraCD optical CD metrology platforms for 65 nm and below IC production, K-T Analyzer lithography correctable platform provides automated, on-tool analysis of overlay and critical dimension metrology data in real time. System gives engineers immediate feedback on quality of lithography process, enabling them to correct errors, minimize...Read More »
Luminescent to Provide Enabling Lithography Platform to Cypress's Silicon Valley Technology Center
SVTC and Luminescent to Jointly Develop New Manufacturing Approach Using Inverse Lithography Technology (ILT) MOUNTAIN VIEW, Calif. and SAN JOSE, Calif., Oct. 3 -- Luminescent Technologies, Inc. and Silicon Valley Technology Center (SVTC), a division of Cypress Semiconductor Corp. (NYSE:CY) today announced a joint development program in which the companies will collaborate on advanced lithography...Read More »
Choosing an Optimal Custom Label Printer: 5 Key Factors
Read about the 5 primary key factors you should consider when choosing an optimal label printer for your company.Read More »
Chip Mask Creator provides complete ILT capability.
Acting as replacement for Resolution Enhancement Technology (RET) software, Explorer uses Inverse Lithography Technology (ILT) platform to evaluate desired on-wafer pattern and mathematically determine mask features needed to produce intended silicon outcome. ILT analyzes entire image and generates globally optimized mask design in single pass. Combining software and hardware, Explorer features...Read More »
AFM System offers nanolithography and manipulation feature.
MFP-3D-® AFM System consists of digital controller, Igor Pro software, and Nanopositioning system. With MicroAngelo feature, system allows nanolithography images to be imported from other programs or generated within software environment. Imported images are converted into series of contour lines which are then scaled and used to drive scanner to create lithographic image. Sensored, closed loop...Read More »
Stepper Family suits nanotechnology applications.
NanoTech(TM) 100 offers 1.0 or 0.8 micron lens options, Machine Vision System (MVS), and PC controller. NanoTech 160 is available with 2.0, 1.0, or 0.8 micron lens. NanoTech 190 offers 2.0 or 1.0 micron lens and application-specific, air-bearing rowbar patterning system. Designed for processing thick and thin films, NanoTech 200 features 1.4 or 1.0 micron lens options. With production resolution...Read More »
Indium Corporation has developed a new twist on traditional solder by developing a composite with a reinforced matrix internal structure. The result is a solder with increased strength and reliability. Check out this video to learn more about the mechanics behind the groundbreaking technology.Read More »