Lithography Equipment

Semiconductor Processing Equipment

Analyzer facilitates lithography cell qualification.

Integrated with Archer overlay, eCD CD SEM, and SpectraCD optical CD metrology platforms for 65 nm and below IC production, K-T Analyzer lithography correctable platform provides automated, on-tool analysis of overlay and critical dimension metrology data in real time. System gives engineers immediate feedback on quality of lithography process, enabling them to correct errors, minimize...

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Semiconductor Processing Equipment

Luminescent to Provide Enabling Lithography Platform to Cypress's Silicon Valley Technology Center

SVTC and Luminescent to Jointly Develop New Manufacturing Approach Using Inverse Lithography Technology (ILT) MOUNTAIN VIEW, Calif. and SAN JOSE, Calif., Oct. 3 -- Luminescent Technologies, Inc. and Silicon Valley Technology Center (SVTC), a division of Cypress Semiconductor Corp. (NYSE:CY) today announced a joint development program in which the companies will collaborate on advanced lithography...

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Lithography Equipment

Chip Mask Creator provides complete ILT capability.

Acting as replacement for Resolution Enhancement Technology (RET) software, Explorer uses Inverse Lithography Technology (ILT) platform to evaluate desired on-wafer pattern and mathematically determine mask features needed to produce intended silicon outcome. ILT analyzes entire image and generates globally optimized mask design in single pass. Combining software and hardware, Explorer features...

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AFM System offers nanolithography and manipulation feature.
Lithography Equipment

AFM System offers nanolithography and manipulation feature.

MFP-3D® AFM System consists of digital controller, Igor Pro software, and Nanopositioning system. With MicroAngelo feature, system allows nanolithography images to be imported from other programs or generated within software environment. Imported images are converted into series of contour lines which are then scaled and used to drive scanner to create lithographic image. Sensored, closed...

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Lithography Equipment

Stepper Family suits nanotechnology applications.

NanoTech(TM) 100 offers 1.0 or 0.8 micron lens options, Machine Vision System (MVS), and PC controller. NanoTech 160 is available with 2.0, 1.0, or 0.8 micron lens. NanoTech 190 offers 2.0 or 1.0 micron lens and application-specific, air-bearing rowbar patterning system. Designed for processing thick and thin films, NanoTech 200 features 1.4 or 1.0 micron lens options. With production resolution...

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