Lithography Equipment

Lithography Equipment

Heidelberg Instruments to Support Micro and Nano Research at the University of Uppsala, Sweden

Heidelberg, Germany, November 23, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Angstrom Microstructure Laboratory of the University of Uppsala, Sweden. The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm. The DWL 200 lithography system will...

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Marking Equipment

Heidelberg Instruments, Gmbh, Announces the Receipt of a Repeat Order for an Advanced Mask Write System by a Chinese Based Mask Supplier

Heidelberg, Germany, November 16, 2006: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the order for an advanced MW800fs system by Shenzhen New Way Electronic Co., LTD., Shenzhen, China. Founded in 1997, Shenzhen New Way Electronic Co., LTD concentrates on production of advanced photomasks in the areas of LCD, PCB and...

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Masks and Masking

Heidelberg Instruments, GmbH, Announces the Order of an Advanced Maskless Lithography System by a Major Japanese Based customer

Heidelberg, Germany, November 8, 2006: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the sale of an advance MW800fbm to a major company in Japan. This system will be used for production of high end display components. MW800fbm is the latest generation of maskless lithography systems supplied by Heidelberg Instruments for...

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Imaging Equipment

SF-100 Rotational Stage Assembly Provides MicroPatterning of Cylindrical Surfaces

St. Petersburg, Florida, October 24, 2006: Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced a new, unique enhancement to the SF-100 maskless micropatterning system, termed the SF-100 Rotational Stage Assembly. This additional capability allows for micro patterning of features seamlessly on cylindrical curved surfaces. The SF-100 is a unique, maskless photolithography system...

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Semiconductor Processing Equipment

Ultratech Expands Advanced-Packaging Offerings with New Low-Cost Unity Platform(TM)-Based Tools Targeting Foundry Customers

Unity GOLD and Unity PLATINUM Deliver Low-risk, Low-cost, Production-Proven Lithography Solutions SAN JOSE, Calif., Sept. 19 /-- Ultratech, Inc. (NASDAQ:UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductors and nanotechnology devices, today introduced two new advanced-packaging (AP) lithography tools built on the company's highly successful Unity...

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Lithography Equipment

Heidelberg Instruments to Support MEMS Research at the Institute of Electron Technology, Poland, with an Advanced DWL200 Maskless Laser Lithography System

2006-09-16--Heidelberg, Germany, September 16, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Institute of Electron Technology Warsaw, Poland. The DWL200 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write area of up to 200 mm by 200 mm. The DWL200 maskless lithography...

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Lithography Equipment

Heidelberg Instruments to Support Micro and Nano Research at the Boston University Photonics Center, Boston, USA

Heidelberg, Germany, September 13, 2006: Heidelberg Instruments announced the sale of an advanced DWL66 fs maskless laser lithography system to the Boston University Photonics Center. The DWL66 fs maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce minimum features down to 0.6 microns. The Heidelberg direct write laser system...

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Lithography Equipment

SF-100 Used for Micro-Numbering of Individual Die and Other Components

St. Petersburg, Florida, April 27, 2006: Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced a new, unique application of the SF-100 system for micro-numbering of individual components. The SF-100 is a unique, maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning, LLC from the University of South Florida. Smart...

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Lithography Equipment

Intelligent Micro Patterning Provides SF-100 to Purdue University for Development of Three Dimensional MicroScale Rapid Prototyping

Intelligent Micro Patterning Provides SF-100 to Purdue University for Development of Three Dimensional MicroScale Rapid Prototyping St. Petersburg, Florida, April 5, 2006: Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced the sale of an SF-100 maskless exposure system to the Department of Electronic and Electrical Engineering at Purdue University, West Lafayette, Indiana. The...

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Semiconductor Processing Equipment

Analyzer facilitates lithography cell qualification.

Integrated with Archer overlay, eCD CD SEM, and SpectraCD optical CD metrology platforms for 65 nm and below IC production, K-T Analyzer lithography correctable platform provides automated, on-tool analysis of overlay and critical dimension metrology data in real time. System gives engineers immediate feedback on quality of lithography process, enabling them to correct errors, minimize...

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Dies & Stamping Services with Over 25 Years of Experience
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Dies & Stamping Services with Over 25 Years of Experience

PDS is an established leader in progressive die stamping, with a reputation for providing precision and value that dates back more than half a century. Through extensive capabilities and a staff of seasoned professionals, we set the standard for quality, delivering flexible services that can meet the needs of the most challenging requirements. See our video to learn more.

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