Energetiq EUV Light Source Installed on CEA-Leti Research Tool
Electrodeless Z-Pinch EUV System Used in Photoresist Outgassing Studies WOBURN, Mass., Feb. 28 -- Energetiq Technology, Inc., a developer and manufacturer of specialized short wavelength light products for use in advanced technology applications, has announced that the company's EQ- 10 Extreme Ultraviolet (EUV) Light Source is being used on a new experimental tool developed by CEA-Leti in studies...
Read More »Luminescent Unveils 45- and 32-nm Resolution Enhancement Technology Results Using Inverse Lithography Technology (ILT)
Evaluations Confirm ILT as Best RET Approach to Optimize 45- and 32-nm IC Designs for Manufacturability PALO ALTO, Calif., Feb. 27 // -- Luminescent Technologies, Inc., a provider of revolutionary lithography-enhancement products to the global semiconductor industry, today unveiled new results of its most aggressive deployment of Inverse Lithography Technology (ILT) to date -- this time on...
Read More »Heidelberg Instruments to Support Nano Research at the University of California, Santa Barbara, Nano Fabrication Facility
Heidelberg, Germany, November 20, 2006 -- Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Nano Fabrication Facility at the University of California, Santa Barbara. The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm. About Heidelberg Instruments, GmbH...
Read More »Heidelberg Instruments to Support Micro and Nano Research at the University of Uppsala, Sweden
Heidelberg, Germany, November 23, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Angstrom Microstructure Laboratory of the University of Uppsala, Sweden. The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm. The DWL 200 lithography system will...
Read More »
Hot Forging Process
Check out this white paper to learn about the benefits of hot forging.
Read More »Heidelberg Instruments, Gmbh, Announces the Receipt of a Repeat Order for an Advanced Mask Write System by a Chinese Based Mask Supplier
Heidelberg, Germany, November 16, 2006: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the order for an advanced MW800fs system by Shenzhen New Way Electronic Co., LTD., Shenzhen, China. Founded in 1997, Shenzhen New Way Electronic Co., LTD concentrates on production of advanced photomasks in the areas of LCD, PCB and...
Read More »Heidelberg Instruments, GmbH, Announces the Order of an Advanced Maskless Lithography System by a Major Japanese Based customer
Heidelberg, Germany, November 8, 2006: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the sale of an advance MW800fbm to a major company in Japan. This system will be used for production of high end display components. MW800fbm is the latest generation of maskless lithography systems supplied by Heidelberg Instruments for...
Read More »SF-100 Rotational Stage Assembly Provides MicroPatterning of Cylindrical Surfaces
St. Petersburg, Florida, October 24, 2006: Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced a new, unique enhancement to the SF-100 maskless micropatterning system, termed the SF-100 Rotational Stage Assembly. This additional capability allows for micro patterning of features seamlessly on cylindrical curved surfaces. The SF-100 is a unique, maskless photolithography system...
Read More »Ultratech Expands Advanced-Packaging Offerings with New Low-Cost Unity Platform(TM)-Based Tools Targeting Foundry Customers
Unity GOLD and Unity PLATINUM Deliver Low-risk, Low-cost, Production-Proven Lithography Solutions SAN JOSE, Calif., Sept. 19 /-- Ultratech, Inc. (NASDAQ:UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductors and nanotechnology devices, today introduced two new advanced-packaging (AP) lithography tools built on the company's highly successful Unity...
Read More »Heidelberg Instruments to Support MEMS Research at the Institute of Electron Technology, Poland, with an Advanced DWL200 Maskless Laser Lithography System
2006-09-16--Heidelberg, Germany, September 16, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Institute of Electron Technology Warsaw, Poland. The DWL200 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write area of up to 200 mm by 200 mm. The DWL200 maskless lithography...
Read More »Heidelberg Instruments to Support Micro and Nano Research at the Boston University Photonics Center, Boston, USA
Heidelberg, Germany, September 13, 2006: Heidelberg Instruments announced the sale of an advanced DWL66 fs maskless laser lithography system to the Boston University Photonics Center. The DWL66 fs maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce minimum features down to 0.6 microns. The Heidelberg direct write laser system...
Read More »
Standex Engraving Mold-Tech Offers Nickel Shell Capabilities on a Global Scale
Standex Engraving Mold-Tech is the premier, global supplier for mold texturing and surface finishing. With a full range of services, Standex Engraving Mold-Tech is also the only nickel shell supplier producing in three global locations. See our video to learn more.
Read More »
