Lithography System suits hard disk drive applications.
Enabling both development and pilot-production of patterned media applications, Imprio-® HD 2200 offers fully automated, double-sided disk patterning and throughput of 180 disks/hr. Step and Flash Imprint Lithography process leverages Drop-on-Demand technology, which places low-viscosity resists only where needed, eliminating waste of consumables. Since S-FIL technology consists of liquid,...
Read More »Intelligent Micro Patterning Enters South America with SF-100 Sale to Universidad de los Andes, Columbia
JANUARY 15, 2008 Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced the sale of an SF-100 system to the Department of Electrical Engineering at the Universidad de los Andes in Colombia, South America. The SF-100 is a unique, maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning, LLC from the University of South...
Read More »Akrion Ships Another Single Wafer Pre-Photolithography Clean System
ALLENTOWN, Pa., Dec. 20 -- Akrion, Inc. ( Akrion ), a supplier of semiconductor surface preparation equipment, recently shipped another Velocity(TM) single wafer cleaning system to a major IC device manufacturer in Asia. The Velocity system will be used for an advanced pre-photolithography cleaning application. This cleaning application is important as it minimizes the photolithography re-work...
Read More »California NanoSystems Institute at UCLA Acquires SF-100 Maskless Lithography System
St. Petersburg, Florida, October 30, 2007: Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced the sale of an SF-100 system to the California NanoSystems Institute (CNSI) at the University of California at Los Angelos (UCLA), today. The SF-100 is a unique, maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning,...
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Thermal Solutions Guide: The Challenges for Heavy Equipment OEMs
In this guide, we consider some of the most common applications that require thermal solutions, such as vehicle exhausts, fuel tank shielding, and engine compartments, firewalls, & underbodies. As well as the options available to mitigate risk around combustion engines.
Read More »Ultratech Wins 2007 Advanced Packaging Award for 3D Packaging Innovation
The AP300 DSA Lithography System Features Through-Silicon Via Alignment Capability SAN JOSE, Calif., July 26 / / - Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductors for flat-panel displays, today announced that its AP300 Dual-Side Alignment (DSA) lithography system won the 2007 Advanced Packaging Award (APA) in the...
Read More »Luminescent Wins Order from Premier U.S. Semiconductor Manufacturer
MONTEREY, Calif., Sept. 17 / / - BACUS 2007 - Luminescent Technologies, Inc., a provider of ground-breaking lithography-enhancement products to the global semiconductor industry, today announced an order for its Luminizer(TM) inverse lithography system from a leading U.S. semiconductor manufacturer. The customer will install the next-generation RET tool in its 32-nm lithography development flow....
Read More »Unimicron Chooses Heidelberg Instruments' VPG 800 System for Production of Advanced Electronic Photomasks
2007-09-04 Heidelberg, Germany, September 04, 2007: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a VPG 800 Maskless Lithography System from Unimicron Corporation, Taiwan. VPG 800 is the latest innovation from Heidelberg instruments, ideal for high volume production of today's demanding photomasks in advanced electronic...
Read More »Photo Sciences: Commercial Photomask and Micro-Patterning Solutions
In September 2007 Photo Sciences successfully introduced a new process and procedure to enable commercial photomask lithography and micro patterning solutions to a range of nano scale technologies in addition to semi conductors. Traditionally this photomask techonology and chemical milling is commonly applied to semiconductors but with Photo Sciences commercial photomask lithography and micro...
Read More »Rohm and Haas Electronic Materials Invests $60 Million in 193nm Immersion Lithography System
MARLBOROUGH, Mass., June 26 / - Rohm and Haas Electronic Materials (NYSE:ROH) will invest $60 million in leading edge lithography equipment to support its extensive research and development of advanced 193 nanometer (nm) photoresist and anti-reflective coatings used in the manufacture of semiconductor devices. As a leading material supplier to the semiconductor industry, our ability to deliver...
Read More »Pattern Generator can accommodate address grid down to 50 nm.
Suited for high volume production of packaging photomasks, Volume Pattern Generator (VPG) line of large area lithography systems feature exposure speed of over 17,000 mm-²/min. Systems can be configured with various stage dimensions designed to accommodate substrate sizes of 1,600 x 1,400, 1,100 x 1,100, and 800 x 800 mm. They can also be equipped with air-bearing stage, semi or fully automatic...
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Error Proofing by Design
Sturtevant Richmont's torque tools help customers cut rework and warranty costs while increasing throughput.
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