Lithography Equipment

Lithography Equipment

Akrion Ships Another Single Wafer Pre-Photolithography Clean System

ALLENTOWN, Pa., Dec. 20 -- Akrion, Inc. ( Akrion"), a supplier of semiconductor surface preparation equipment, recently shipped another Velocity(TM) single wafer cleaning system to a major IC device manufacturer in Asia. The Velocity system will be used for an advanced pre-photolithography cleaning application. This cleaning application is important as it minimizes the photolithography re-work...

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Lithography Equipment

California NanoSystems Institute at UCLA Acquires SF-100 Maskless Lithography System

St. Petersburg, Florida, October 30, 2007: Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced the sale of an SF-100 system to the California NanoSystems Institute (CNSI) at the University of California at Los Angelos (UCLA), today. The SF-100 is a unique, maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning,...

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Lithography Equipment

Ultratech Wins 2007 Advanced Packaging Award for 3D Packaging Innovation

The AP300 DSA Lithography System Features Through-Silicon Via Alignment Capability SAN JOSE, Calif., July 26 / / - Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductors for flat-panel displays, today announced that its AP300 Dual-Side Alignment (DSA) lithography system won the 2007 Advanced Packaging Award (APA) in the...

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Semiconductor Processing Equipment

Luminescent Wins Order from Premier U.S. Semiconductor Manufacturer

MONTEREY, Calif., Sept. 17 / / - BACUS 2007 - Luminescent Technologies, Inc., a provider of ground-breaking lithography-enhancement products to the global semiconductor industry, today announced an order for its Luminizer(TM) inverse lithography system from a leading U.S. semiconductor manufacturer. The customer will install the next-generation RET tool in its 32-nm lithography development flow....

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Lasers

Unimicron Chooses Heidelberg Instruments' VPG 800 System for Production of Advanced Electronic Photomasks

2007-09-04 Heidelberg, Germany, September 04, 2007: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a VPG 800 Maskless Lithography System from Unimicron Corporation, Taiwan. VPG 800 is the latest innovation from Heidelberg instruments, ideal for high volume production of today's demanding photomasks in advanced electronic...

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Lithography Equipment

Photo Sciences: Commercial Photomask and Micro-Patterning Solutions

In September 2007 Photo Sciences successfully introduced a new process and procedure to enable commercial photomask lithography and micro patterning solutions to a range of nano scale technologies in addition to semi conductors. Traditionally this photomask techonology and chemical milling is commonly applied to semiconductors but with Photo Sciences commercial photomask lithography and micro...

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Lithography Equipment

Rohm and Haas Electronic Materials Invests $60 Million in 193nm Immersion Lithography System

MARLBOROUGH, Mass., June 26 / - Rohm and Haas Electronic Materials (NYSE:ROH) will invest $60 million in leading edge lithography equipment to support its extensive research and development of advanced 193 nanometer (nm) photoresist and anti-reflective coatings used in the manufacture of semiconductor devices. As a leading material supplier to the semiconductor industry, our ability to deliver...

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Beam Generators

Pattern Generator can accommodate address grid down to 50 nm.

Suited for high volume production of packaging photomasks, Volume Pattern Generator (VPG) line of large area lithography systems feature exposure speed of over 17,000 mmÂ-²/min. Systems can be configured with various stage dimensions designed to accommodate substrate sizes of 1,600 x 1,400, 1,100 x 1,100, and 800 x 800 mm. They can also be equipped with air-bearing stage, semi or fully...

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Lithography Equipment

Energetiq EUV Light Source Installed on CEA-Leti Research Tool

Electrodeless Z-Pinch EUV System Used in Photoresist Outgassing Studies WOBURN, Mass., Feb. 28 -- Energetiq Technology, Inc., a developer and manufacturer of specialized short wavelength light products for use in advanced technology applications, has announced that the company's EQ- 10 Extreme Ultraviolet (EUV) Light Source is being used on a new experimental tool developed by CEA-Leti in studies...

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Lithography Equipment

Luminescent Unveils 45- and 32-nm Resolution Enhancement Technology Results Using Inverse Lithography Technology (ILT)

Evaluations Confirm ILT as Best RET Approach to Optimize 45- and 32-nm IC Designs for Manufacturability PALO ALTO, Calif., Feb. 27 // -- Luminescent Technologies, Inc., a provider of revolutionary lithography-enhancement products to the global semiconductor industry, today unveiled new results of its most aggressive deployment of Inverse Lithography Technology (ILT) to date -- this time on...

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