Lithography Equipment

US Circuit Installs New Maskless DDI Line

Escondido, California: U.S. Circuit, manufacturer of bare printed circuit boards, out of Escondido, California, has installed a MLI-2024 DI (direct imaging) machine, purchased from Maskless Lithography, of San Jose, CA. Ed Carignan, COO of Maskless Lithography, stated, the MLI-2024 machine is a great complement to U.S. Circuit's technology and will provide Mike and his team with a high...

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EUV Light Source targets HVM testing applications.

Operating at pulse rate of 10 kHz, EQ-10HR produces EUV light suited for infrastructure development for EUV lithography. It incorporates electrodeless Z-Pinch technology, which inductively couples current into discharge plasma, optimizing plasma control and stability and confining plasma away from source components. Product offers simplified integration into process tools and maintains repetition...

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Desktop Nanofabrication System combines DPN, AFM processes.

Utilizing Dip Pen NanolithographyÂ-® (DPNÂ-®) process, DPN 5000 system offers nanopatterning capabilities coupled with AFM (atomic force microscopy) imaging for immediate characterization of deposited patterns. Various custom MEMS-based ink delivery devices allow range of materials to be deposited under precisely controlled conditions. Included lithography software, InkCAD(TM) 4.0, offers...

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Maskless Lithography System offers scalable functionality.

Providing 1 micron min feature size, SF-100 XPRESS can be custom-configured with various options to meet specific application requirements. Maskless exposure system utilizes Smart Filter technology, which incorporates micro-optical techniques to project master images directly onto diverse substrate materials. Serving researchers and manufacturers in various market segments, system capabilities...

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CMAA Crane Buyer's Guide
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CMAA Crane Buyer's Guide

CMAA has organized this Buyer's Guide to promote standardization and to assist prospective buyer's of electric overhead traveling cranes in selection of equipment most suitable for their applications.

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Intelligent Micro Patterning Enters South America with SF-100 Sale to Universidad de los Andes, Columbia

JANUARY 15, 2008 Intelligent Micro Patterning, LLC, St. Petersburg, Florida, announced the sale of an SF-100 system to the Department of Electrical Engineering at the Universidad de los Andes in Colombia, South America. The SF-100 is a unique, maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning, LLC from the University of South...

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Rohm and Haas Electronic Materials Invests $60 Million in 193nm Immersion Lithography System

MARLBOROUGH, Mass., June 26 / - Rohm and Haas Electronic Materials (NYSE:ROH) will invest $60 million in leading edge lithography equipment to support its extensive research and development of advanced 193 nanometer (nm) photoresist and anti-reflective coatings used in the manufacture of semiconductor devices. As a leading material supplier to the semiconductor industry, our ability to deliver...

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Pattern Generator can accommodate address grid down to 50 nm.

Suited for high volume production of packaging photomasks, Volume Pattern Generator (VPG) line of large area lithography systems feature exposure speed of over 17,000 mmÂ-²/min. Systems can be configured with various stage dimensions designed to accommodate substrate sizes of 1,600 x 1,400, 1,100 x 1,100, and 800 x 800 mm. They can also be equipped with air-bearing stage, semi or fully...

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Heidelberg Instruments to Support Nano Research at the University of California, Santa Barbara, Nano Fabrication Facility

Heidelberg, Germany, November 20, 2006 -- Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Nano Fabrication Facility at the University of California, Santa Barbara. The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm. About Heidelberg Instruments, GmbH...

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Heidelberg Instruments to Support Micro and Nano Research at the University of Uppsala, Sweden

Heidelberg, Germany, November 23, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Angstrom Microstructure Laboratory of the University of Uppsala, Sweden. The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm. The DWL 200 lithography system will...

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Heidelberg Instruments, Gmbh, Announces the Receipt of a Repeat Order for an Advanced Mask Write System by a Chinese Based Mask Supplier

Heidelberg, Germany, November 16, 2006: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the order for an advanced MW800fs system by Shenzhen New Way Electronic Co., LTD., Shenzhen, China. Founded in 1997, Shenzhen New Way Electronic Co., LTD concentrates on production of advanced photomasks in the areas of LCD, PCB and...

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Neagle Choice, LLC Announces New Available Services
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Neagle Choice, LLC Announces New Available Services

Neagle Choice has long been known as a quality source for commercial sewing, printing, die cutting, and the manufacturing of a wide range of custom products. Enhancing our service capabilities has been the key to our success, and has driven our growth into many new and exciting markets. Continuing on this trajectory, we now offer precision laser cutting and etching, adding to our long line of manufacturing services. See our video to learn all about it.

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