Lithography Equipment

US Circuit Installs New Maskless DDI Line

Escondido, California: U.S. Circuit, manufacturer of bare printed circuit boards, out of Escondido, California, has installed a MLI-2024 DI (direct imaging) machine, purchased from Maskless Lithography, of San Jose, CA. Ed Carignan, COO of Maskless Lithography, stated, the MLI-2024 machine is a great complement to U.S. Circuit's technology and will provide Mike and his team with a high...

Read More »

Boone Newspapers Chooses alfaQuest Technologies and Southern Lithoplate for Affordable Conversion from Analog to Digital Publishing

ROLLING MEADOWS, Ill. - Boone Newspapers, Inc. has implemented a new digital prepress workflow built around the Esprit violet platesetter from alfaQuest Technologies, Inc. and Southern Lithoplate violet printing plates. The newspaper company installed the computer-to-plate (CtP) system at the Alexander City Outlook in Alexander City, Ala. I want to say how happy I am with the Esprit platemaker...

Read More »

Two CIPPI Awards for Ten Brink / Hooiberg Haasbeek

Dutch KBA Rapida 106 user lands a double at CIP4 International Print Production Innovation (CIPPI) Awards The CIP4 International Print Production Innovation (CIPPI) Awards are amongst the most coveted in the print media industry, and following on from 2007 and 2008, this year a KBA sheetfed customer once again stood on the winners' rostrum. Dutch printer Ten Brink / Hooiberg Haasbeek, which is...

Read More »

Ultratech Receives Significant Multi-System, Follow-On Laser Spike Anneal Order from Large Foundry in Asia

LSA100A Systems to Support 45-nm Production Ramp SAN JOSE, Calif. - Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced that a large foundry in Asia has placed a significant multi-system, follow-on order for its laser spike anneal (LSA) tools. Ultratech's...

Read More »

Soft UV Nanoimprint Lithography allows pattern features to 12.5 nm.

Based on UV-NIL systems, Soft Molecular Scale Nanoimprint Lithography (SMS-NIL) technology enables ultra-high-resolution patterning of features down to 12.5 nm on large-area surfaces. Soft working stamp process allows full-area nanoimprints and optically aligned UV-NIL on existing EVG equipment. While stamp and imprinting can be processed on same tool without additional processing steps, soft...

Read More »

Computer-to-Plate Printer suits small and medium print shops.

Based on Epson StylusÂ-® Pro 7900 printer with 24 in. wide format, Epson Stylus Pro 7900CTP includes plate curing device, EFIÂ-® Computer-to-Plate RIP software package, and plate guide attachment. DirectPlate Aluminum technology enables true aluminum lithographic printing press plates to be created using Epson UltraChromeÂ-® HDR inks, and each plate can be used to produce up to 20,000...

Read More »

Lithography System optimizes mask integrity.

Designed to address challenges of mask manufacturing of 193i Optical Immersion and Extreme Ultraviolet Lithography, MaskTrack Pro Bake/Develop brings together ASonicÂ-® develop technology with Post-Exposure Bake regime for CD uniformity matching, crucial to sub 22 nm DPT production. Designed to equalize develop rate, independent of feature size and pattern loading, ASonic approach minimizes...

Read More »

Dedicated Lithography System meets LED industry needs.

Used for production of high-brightness light emitting diodes (HB-LEDs), MA100e Gen2 Automatic Mask Aligner processes wafers up to 4 in. and enables throughput of 145 wafers/hr. High-intensity exposure optics and pre-alignment options minimize process time, while functionalities such as proximity exposure for high resolution down to 2.5 Â-µm maximize yield. All together, functionality helps...

Read More »

Maskless Lithography System offer resolutions to 1 micron.

Available with optimized optics and precision stages, SF-100 XCEL (5 micron resolution) and SF-100 XPRESS (1 micron resolution) are based on maskless photolithography technology that utilizes Smart Filter technology. Latter incorporates micro-optical techniques to project master images directly onto silicon wafers; diverse substrate materials - quartz, ceramics, metals and plastics; and photomask...

Read More »

EUV Light Source targets HVM testing applications.

Operating at pulse rate of 10 kHz, EQ-10HR produces EUV light suited for infrastructure development for EUV lithography. It incorporates electrodeless Z-Pinch technology, which inductively couples current into discharge plasma, optimizing plasma control and stability and confining plasma away from source components. Product offers simplified integration into process tools and maintains repetition...

Read More »

All Topics