Axcelis Announces Multiple Wins for 'Purion XE' High Energy System Including New Foundry Penetration
Innovative Platform Delivers Industry Leading Purity, Precision and Productivity to Meet Future Process Challenges as Well as Today's Production Requirements BEVERLY, Mass.Ã- — Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of enabling ion implantation solutions for the semiconductor industry, announced multiple wins for the Company's Purion XE single wafer, high energy...
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GSD Ultra and HC3 Ultra implanters enable high-volume production of ultra shallow junctions. Designed for 200 mm applications, GSD Ultra is based on GSD multi-wafer endstation. HC3 Ultra is designed for 300 mm manufacturing and offers high current processing from 0.2 to 80 keV. Packaging design of both implanters allows for easy maintenance access and maximum tool uptime.
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