Press Release Summary:
DRYMAC PDR-C series with multi-stage Roots pump design is available in 47, 74, and 139 cfm ratings, with integrated booster pumps for 200, 400 or 600 cfm. Lightweight aluminum casing and rotor create uniform operating temperatures throughout six Roots stages. Uniform temperatures help prevent condensable process gas byproducts from adhering to internal pump surfaces. Unit is coated in Tufram for resistance to chemical corrosion and wear.
Original Press Release:
ULVAC Technologies, Inc. Offers PDR Vacuum Pump for CVD or Etch Applications
Methuen, Mass. - ULVAC Technologies, Inc. (www.ulvac.com), a leading supplier of production systems, instrumentation, and vacuum pumps for the semiconductor industry, announces its DRYMAC PDR-C series vacuum pump, which features an advanced multi-stage Roots pump design. With its all-aluminum construction, the PDR is ideal for CVD and etch applications. The lightweight aluminum casing and rotor create maximum energy efficiency and uniform operating temperatures throughout the six Roots stages.
The PDR's uniform temperatures help prevent condensable process gas byproducts from adhering to the internal pump surfaces. In addition, the entire unit is coated in TUFRAM for enhanced resistance to chemical corrosion and wear. ULVAC's modern, compact PDR pumps use a canned motor for leak tightness and are equipped with a microcomputer control system that monitors pump status and alarms via RS232C and a handheld controller.
ULVAC's PDR series pumps are offered in three sizes (47, 74 & 139 cfm @ 60Hz). Versions are also available with integrated booster pumps for pumping speeds of 200, 400 or 600 cfm. Configurations include cool, high, and ultra-high pump operating temperature models. Several utilities including shaft seal purge gas, ballast gas, and cooling water are fully adjustable and can be regulated directly at the pump. The precision balanced aluminum rotor helps ensure smooth vibration-free operation and quiet running performance.