Sputter Ion Pumps have no moving parts.

Press Release Summary:



Vibration-free ACTER series sputter ion pumps for ultra high and extremely high vacuum (UHV and XHV) applications consist of optimized magnetic field and internal pumping arrays (ACTER cells). Pumps offer minimal magnetic flux density leakage and rapid recovery from brief power interruptions. They have no moving parts, and can attain ultimate pressure of 10E-10 Pa. Suitable applications include accelerators and electron microscopes.



Original Press Release:


ULVAC Technologies, Inc. Offers Sputter Ion Pumps for UHV and XHV


Methuen, Mass. - ULVAC Technologies, Inc. (www.ulvac.com), a leading supplier of production systems, instrumentation, and vacuum pumps for a variety of industries, introduces its ACTER series of sputter ion pumps for ultra high and extremely high vacuum (UHV and XHV) applications. The ion pumps' unique design consists of an optimized magnetic field and internal pumping arrays (ACTER cells), which generate significantly higher pumping speeds at lower pressures than other ion pumps, saving pump down time and enabling the pump to reach lower pressures. These pumps are typically 4 times higher in pumping speed than other ion pumps at UHV pressures and below.

With minimal magnetic flux density leakage and rapid recovery from brief power interruptions at UHV and XHV pressures, the ACTER series is ideally suited for accelerators, electron microscopes, or similar analytical equipment. ULVAC's ACTER pumps have no moving parts, making them vibration free, and maintenance intervals are measured in years. The pumps can attain an ultimate pressure of 10E-10 Pa.

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